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公开(公告)号：US20250079114A1
公开(公告)日：2025-03-06
申请号：US18793576
申请日：2024-08-02
Applicant: APPLIED MATERIALS, INC.
Inventor： ANDREI KHOMENKO , LEONID DORF , EVGENY KAMENETSKIY , VIACHESLAV PLOTNIKOV , RAJINDER DHINDSA
Abstract: Embodiments include a plasma processing apparatus including a chamber with an inner chamber wall. A workpiece support is within the inner chamber wall, the workpiece support for supporting a workpiece in a processing region of the chamber. An ion probe extends through the chamber and inner chamber wall and into a plasma region above the workpiece.
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