公开(公告)号：US20180209043A1

公开(公告)日：2018-07-26

申请号：US15928622

申请日：2018-03-22

Applicant: APPLIED MATERIALS, INC.

Inventor： SHU-KWAN LAU ,  ZHEPENG CONG ,  MEHMET TUGRUL SAMIR ,  ZHIYUAN YE ,  DAVID K. CARLSON ,  XUEBIN LI ,  ERROL ANTONIO C. SANCHEZ ,  SWAMINATHAN SRINIVASAN

IPC: C23C16/455 ,  C30B25/14

CPC classification number: C23C16/45563 ,  C23C16/45514 ,  C30B25/14

Abstract: Apparatus for processing a substrate in a process chamber are provided here. In some embodiments, a gas injector for use in a process chamber includes a first set of outlet ports that provide an angled injection of a first process gas at an angle to a planar surface, and a second set of outlet ports proximate the first set of outlet ports that provide a pressurized laminar flow of a second process gas substantially along the planar surface, the planar surface extending normal to the second set of outlet ports.

公开(公告)号：US20140137801A1

公开(公告)日：2014-05-22

申请号：US14047047

申请日：2013-10-07

Applicant: APPLIED MATERIALS, INC.

Inventor： SHU-KWAN LAU ,  ZHEPENG CONG ,  MEHMET TUGRUL SAMIR ,  ZHIYUAN YE ,  DAVID K. CARLSON ,  XUEBIN LI ,  ERROL ANTONIO C. SANCHEZ ,  SWAMINATHAN SRINIVASAN

IPC: C23C16/455

CPC classification number: C23C16/45563 ,  C23C16/45514 ,  C30B25/14

Abstract: Apparatus for processing a substrate in a process chamber are provided here. In some embodiments, a gas injector for use in a process chamber includes a first set of outlet ports that provide an angled injection of a first process gas at an angle to a planar surface, and a second set of outlet ports proximate the first set of outlet ports that provide a pressurized laminar flow of a second process gas substantially along the planar surface, the planar surface extending normal to the second set of outlet ports.

Abstract translation: 在此处提供用于处理处理室中的基板的设备。 在一些实施例中，用于处理室的气体注射器包括第一组出口端口，其提供与平坦表面成一定角度的第一处理气体的成角度注入，以及靠近第一组 出口端口，其基本上沿平面表面提供第二处理气体的加压层流，平面垂直于第二组出口延伸。