公开(公告)号：US20180209043A1

公开(公告)日：2018-07-26

申请号：US15928622

申请日：2018-03-22

Applicant: APPLIED MATERIALS, INC.

Inventor： SHU-KWAN LAU ,  ZHEPENG CONG ,  MEHMET TUGRUL SAMIR ,  ZHIYUAN YE ,  DAVID K. CARLSON ,  XUEBIN LI ,  ERROL ANTONIO C. SANCHEZ ,  SWAMINATHAN SRINIVASAN

IPC: C23C16/455 ,  C30B25/14

CPC classification number: C23C16/45563 ,  C23C16/45514 ,  C30B25/14

Abstract: Apparatus for processing a substrate in a process chamber are provided here. In some embodiments, a gas injector for use in a process chamber includes a first set of outlet ports that provide an angled injection of a first process gas at an angle to a planar surface, and a second set of outlet ports proximate the first set of outlet ports that provide a pressurized laminar flow of a second process gas substantially along the planar surface, the planar surface extending normal to the second set of outlet ports.

公开(公告)号：US20150176123A1

公开(公告)日：2015-06-25

申请号：US14639697

申请日：2015-03-05

Applicant: Applied Materials, Inc.

Inventor： DAVID K. CARLSON ,  Mehmet Tugrul SAMIR ,  Nyi O. MYO

IPC: C23C16/44

CPC classification number: C23C16/4404 ,  C23C16/45574 ,  C23C16/45578

Abstract: Embodiments described herein relate to an apparatus and method for lining a processing region within a chamber. In one embodiment, a modular liner assembly for a substrate processing chamber is provided. The modular liner assembly includes a first liner and a second liner, each of the first liner and second liner comprising an annular body sized to be received in a processing volume of a chamber, and at least a third liner comprising a body that extends through the first liner and the second liner, the third liner having a first end disposed in the process volume and a second end disposed outside of the chamber.

Abstract translation: 本文所述的实施例涉及用于衬里室内的处理区域的装置和方法。 在一个实施例中，提供了一种用于衬底处理室的模块化衬垫组件。 所述模块化衬垫组件包括第一衬垫和第二衬垫，所述第一衬垫和所述第二衬套中的每一个包括尺寸适于容纳在室的处理容积中的环形体，以及至少第三衬套，所述第三衬套包括延伸穿过所述腔体的主体 第一衬里和第二衬套，第三衬里具有设置在处理体积中的第一端和设置在室外的第二端。

公开(公告)号：US20130319015A1

公开(公告)日：2013-12-05

申请号：US13902310

申请日：2013-05-24

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON ,  ERROL ANTONIO C. SANCHEZ ,  KENRIC CHOI ,  MARCEL E. JOSEPHSON ,  DENNIS DEMARS ,  EMRE CUVALCI ,  MEHMET TUGRUL SAMIR

IPC: F25B21/02

CPC classification number: F25B21/02 ,  C23C16/448 ,  C23C16/4482

Abstract: Methods and apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or more thermoelectric devices coupled to the body proximate the opening; a heat sink coupled to the one or more thermoelectric devices; and a fan disposed proximate to a back side of the heat sink to provide a flow of air to the heat sink.

Abstract translation: 本文提供了用于基板处理的前体的热管理方法和装置。 在一些实施例中，用于对基板处理中使用的前体进行热管理的设备可以包括具有开口尺寸的开口的主体，该开口的尺寸适于容纳设置在其中的液体或固体前体的存储容器，所述主体由导热材料制成; 一个或多个耦合到靠近开口的本体的热电装置; 耦合到所述一个或多个热电装置的散热器; 以及靠近所述散热器的后侧设置的风扇，以向所述散热器提供空气流。

公开(公告)号：US20140060435A1

公开(公告)日：2014-03-06

申请号：US13721332

申请日：2012-12-20

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON ,  MICHAEL R. RICE ,  KARTIK B. SHAH ,  KASHIF MAQSOOD ,  PRAVIN K. NARWANKAR

IPC: C30B25/08 ,  E05F1/00

CPC classification number: H01L21/683 ,  B05B1/005 ,  C30B25/08 ,  C30B25/14 ,  C30B29/06 ,  E05F1/00 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/67712 ,  H01L21/6776

Abstract: Apparatus for use in an inline substrate processing tool are provided herein. In some embodiments, a door for use in an inline substrate processing tool between a first and a second substrate processing module coupled to one another in a linear arrangement may include a reflective body disposed between two cover plates of substantially transparent material, configured to reflect light and heat energy into each of the at first and second substrate processing modules, wherein the door is selectively movable, via an actuator coupled to the door, between an open position that fluidly couples the first and second substrate processing modules to a closed position that isolates the first substrate processing module from the second substrate processing module.

Abstract translation: 本文提供了用于在线基板处理工具中的装置。 在一些实施例中，在线性布置中彼此耦合的第一和第二基板处理模块之间的在线基板处理工具中使用的门可以包括设置在基本透明材料的两个盖板之间的反射体， 并且将热能分配到每个第一和第二基板处理模块中，其中门可选择性地通过耦合到门的致动器在将第一和第二基板处理模块流体耦合到打开位置之间选择性地移动，该打开位置将隔离 来自第二基板处理模块的第一基板处理模块。

公开(公告)号：US20130319013A1

公开(公告)日：2013-12-05

申请号：US13902304

申请日：2013-05-24

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON ,  ERROL ANTONIO C. SANCHEZ ,  KENRIC CHOI ,  MARCEL E. JOSEPHSON ,  DENNIS DEMARS

IPC: F25B21/02

CPC classification number: F25B21/02 ,  C23C16/448 ,  C23C16/4482

Abstract: Apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or more thermoelectric devices coupled to the body proximate the opening; and a heat sink coupled to the one or more thermoelectric devices.

Abstract translation: 本文提供了用于基板处理中使用的前体的热管理装置。 在一些实施例中，用于对基板处理中使用的前体进行热管理的设备可以包括具有开口尺寸的开口的主体，该开口的尺寸适于容纳设置在其中的液体或固体前体的存储容器，所述主体由导热材料制成; 一个或多个耦合到靠近开口的本体的热电装置; 以及耦合到所述一个或多个热电装置的散热器。

公开(公告)号：US20150376793A1

公开(公告)日：2015-12-31

申请号：US14766863

申请日：2014-02-18

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON

IPC: C23C16/54 ,  C23C16/458 ,  C30B25/08 ,  C23C16/455

CPC classification number: C23C16/54 ,  C23C16/45504 ,  C23C16/45519 ,  C23C16/45563 ,  C23C16/45578 ,  C23C16/45589 ,  C23C16/4587 ,  C30B25/02 ,  C30B25/025 ,  C30B25/08 ,  C30B25/14 ,  C30B25/165

Abstract: Apparatus for use in a substrate processing chamber are provided herein. In some embodiments, a indexed jet injector for use in a process chamber may include a body having a substantially cylindrical central volume, a gas input port disposed on a first surface of the body, a gas distribution channel formed in the body fluidly coupled to the gas input port and to the cylindrical central volume, a gas distribution drum disposed within the cylindrical central volume and rotabably coupled to the body, the gas distribution drum having a plurality of jet channels formed through the gas distribution drum, and a plurality of indexer output ports formed on a second surface of the body, wherein each of the plurality of jet channels fluidly couple the gas input port to at least one of the plurality of indexer output ports at least once per 360° rotation of the gas distribution drum.

Abstract translation: 本文提供了用于基板处理室的装置。 在一些实施例中，用于处理室的索引式喷射喷射器可以包括具有基本上圆柱形中心体积的本体，设置在主体的第一表面上的气体输入端口，形成在体内的气体分配通道，其流体地联接到 气体输入端口和圆筒形中心体积，气体分配鼓设置在圆筒形中心体积内并可旋转地联接到主体，气体分配鼓具有通过气体分配鼓形成的多个喷射通道，以及多个分度器输出 形成在所述主体的第二表面上的端口，其中所述多个喷射通道中的每一个流体地将所述气体输入端口与所述多个分度器输出端口中的至少一个流体耦合到所述气体分配鼓的每360°旋转中至少一次。

公开(公告)号：US20150361581A1

公开(公告)日：2015-12-17

申请号：US14766338

申请日：2014-02-18

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON

IPC: C30B25/08 ,  C30B29/06 ,  C30B25/10

CPC classification number: C30B25/08 ,  C30B25/105 ,  C30B29/06 ,  H01L21/67115 ,  H01L21/67126 ,  H01L21/67173

Abstract: Apparatus for use in an inline substrate processing tool are provided herein. In some embodiments, a window assembly for use in an inline substrate processing tool may include a window body having an inner surface and an outer surface, the window body including a central translucent portion configured to pass radiant heat emitted from a radiant heat lamp through the central translucent portion, and a surface treated portion disposed about the central translucent portion and disposed on each of the inner and outer surfaces, the surface treated portion configured to minimize total internal reflections of the radiant heat emitted from the radiant heat lamp, and one or more molded seals disposed proximate an outer edge of the window body and on each of the inner and outer surfaces

Abstract translation: 本文提供了用于在线基板处理工具中的装置。 在一些实施例中，用于在线衬底处理工具中的窗组件可以包括具有内表面和外表面的窗体，所述窗体包括中央半透明部分，所述中央半透明部分被配置成使从辐射热灯发出的辐射热通过 中央半透明部分以及设置在中央半透明部分周围并设置在每个内表面和外表面上的表面处理部分，所述表面处理部分被配置为使从辐射热灯发出的辐射热的全部内部反射最小化，以及一个或 更多的模制密封件设置在窗体的外边缘附近并且在每个内表面和外表面上

公开(公告)号：US20150122357A1

公开(公告)日：2015-05-07

申请号：US14596289

申请日：2015-01-14

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON

IPC: F17D1/04

CPC classification number: H01J37/3244 ,  C23C16/45565 ,  C23C16/45574 ,  F17D1/04 ,  H01J37/32633 ,  Y10T137/6579 ,  Y10T137/85938 ,  Y10T137/87153 ,  Y10T137/87265 ,  Y10T137/87281 ,  Y10T137/87885

Abstract: A gas dispersion apparatus for use with a process chamber, comprising: a quartz body having a top, a ring coupled to a bottom surface of the top and a bottom plate having dispersion holes coupled to the ring opposite the top; a plurality of quartz plates disposed between the top and the bottom plate, wherein the plurality of plates are positioned above one another and spaced apart to form a plenum above each of the plurality of plates and the bottom plate; a plurality of quartz tubes to couple the plenums to the plurality of dispersion holes, each of the plurality of quartz tubes having a first end disposed within one of the plenums and having a second end coupled to one of the dispersion holes; and a plurality of conduits disposed through the top, wherein each of the plurality of conduits is coupled to one of the plenums.

Abstract translation: 一种与处理室一起使用的气体分散装置，包括：具有顶部的石英体，联接到顶部的底部表面的环和具有与顶部相对的环的分隔孔的底板; 设置在所述顶板和所述底板之间的多个石英板，其中所述多个板彼此相互间隔开并间隔开，以在所述多个板和所述底板的每一个上方形成气室; 多个石英管，用于将所述通风室连接到所述多个分散孔，所述多个石英管中的每一个具有设置在一个所述增压室内的第一端，并且具有联接到所述分散孔中的一个的第二端; 以及多个通过所述顶部布置的导管，其中所述多个导管中的每一个连接到所述增压室之一。

公开(公告)号：US20140137801A1

公开(公告)日：2014-05-22

申请号：US14047047

申请日：2013-10-07

Applicant: APPLIED MATERIALS, INC.

Inventor： SHU-KWAN LAU ,  ZHEPENG CONG ,  MEHMET TUGRUL SAMIR ,  ZHIYUAN YE ,  DAVID K. CARLSON ,  XUEBIN LI ,  ERROL ANTONIO C. SANCHEZ ,  SWAMINATHAN SRINIVASAN

IPC: C23C16/455

CPC classification number: C23C16/45563 ,  C23C16/45514 ,  C30B25/14

Abstract: Apparatus for processing a substrate in a process chamber are provided here. In some embodiments, a gas injector for use in a process chamber includes a first set of outlet ports that provide an angled injection of a first process gas at an angle to a planar surface, and a second set of outlet ports proximate the first set of outlet ports that provide a pressurized laminar flow of a second process gas substantially along the planar surface, the planar surface extending normal to the second set of outlet ports.

Abstract translation: 在此处提供用于处理处理室中的基板的设备。 在一些实施例中，用于处理室的气体注射器包括第一组出口端口，其提供与平坦表面成一定角度的第一处理气体的成角度注入，以及靠近第一组 出口端口，其基本上沿平面表面提供第二处理气体的加压层流，平面垂直于第二组出口延伸。

公开(公告)号：US20140099778A1

公开(公告)日：2014-04-10

申请号：US14034921

申请日：2013-09-24

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON

IPC: H01L21/677

CPC classification number: H01L21/6776 ,  C23C16/4587 ,  C23C16/481 ,  C23C16/54 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/67712

Abstract: In some embodiments, an indexed inline substrate processing tool may include a substrate carrier having a base and pair of opposing substrate supports having respective substrate support surfaces that extend upwardly and outwardly from the base; and a plurality of modules coupled to one another in a linear arrangement, wherein each module of the plurality of modules comprises an enclosure having a first end, a second end, and a lower surface to support the substrate carrier and to provide a path for the substrate carrier to move linearly through the plurality of modules, and wherein at least one module of the plurality of modules comprises: a window disposed in a side of the enclosure; a heating lamp coupled to the side of the enclosure; a gas inlet disposed proximate a top of the enclosure; and an exhaust disposed opposite the gas inlet.

Abstract translation: 在一些实施例中，索引的在线衬底处理工具可以包括具有基部和一对相对的衬底支撑件的衬底载体，其具有从基部向上和向外延伸的相应的衬底支撑表面; 以及多个模块，其以线性布置彼此耦合，其中所述多个模块中的每个模块包括具有第一端，第二端和下表面的外壳，以支撑所述衬底载体并提供用于 衬底载体线性移动通过所述多个模块，并且其中所述多个模块中的至少一个模块包括：设置在所述外壳侧面的窗口; 耦合到外壳侧面的加热灯; 设置在所述外壳的顶部附近的气体入口; 和与气体入口相对设置的废气。