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公开(公告)号：US09490101B2
公开(公告)日：2016-11-08
申请号：US14658993
申请日：2015-03-16
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Yuval Gronau , Ishai Schwarzband , Benzion Sender , Dror Shemesh , Ran Schleyen , Ofir Greenberg
CPC classification number: H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2803
Abstract: A system for scanning an object, the system may include (a) charged particles optics that is configured to: scan, with a charged particle beam and at a first scan rate, a first region of interest (ROI) of an area of the object; detect first particles that were generated as a result of the scanning of the first ROI; scan, with the charged particle beam and at a second scan rate, a second ROI of the area of the object; wherein the second scan rate is lower than the first scan rate; wherein first ROI differs from the second ROI by at least one parameter; detect second particles that were generated as a result of the scanning of the second ROA; and (b) a processor that is configured to generate at least one image of the area in response to the first and second particles.
Abstract translation: 一种用于扫描对象的系统，系统可以包括（a）带电粒子光学器件，其被配置为：以带电粒子束和第一扫描速率扫描物体的区域的第一感兴趣区域（ROI） ; 检测由于第一ROI的扫描而产生的第一粒子; 用所述带电粒子束以第二扫描速率扫描所述物体区域的第二ROI; 其中所述第二扫描速率低于所述第一扫描速率; 其中第一ROI与所述第二ROI相差至少一个参数; 检测由于第二ROA的扫描而产生的第二颗粒; 以及（b）处理器，被配置为响应于所述第一和第二粒子而产生所述区域的至少一个图像。
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公开(公告)号：US20160276127A1
公开(公告)日：2016-09-22
申请号：US14658993
申请日：2015-03-16
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Yuval Gronau , Ishai Schwarzband , Benzion Sender , Dror Shemesh , Ran Schleyen , Ofir Greenberg
CPC classification number: H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2803
Abstract: A system for scanning an object, the system may include (a) charged particles optics that is configured to: scan, with a charged particle beam and at a first scan rate, a first region of interest (ROI) of an area of the object; detect first particles that were generated as a result of the scanning of the first ROI; scan, with the charged particle beam and at a second scan rate, a second ROI of the area of the object; wherein the second scan rate is lower than the first scan rate; wherein first ROI differs from the second ROI by at least one parameter; detect second particles that were generated as a result of the scanning of the second ROA; and (b) a processor that is configured to generate at least one image of the area in response to the first and second particles.
Abstract translation: 一种用于扫描对象的系统，系统可以包括（a）带电粒子光学器件，其被配置为：以带电粒子束和第一扫描速率扫描物体的区域的第一感兴趣区域（ROI） ; 检测由于第一ROI的扫描而产生的第一粒子; 用所述带电粒子束以第二扫描速率扫描所述物体区域的第二ROI; 其中所述第二扫描速率低于所述第一扫描速率; 其中第一ROI与所述第二ROI相差至少一个参数; 检测由于第二ROA的扫描而产生的第二颗粒; 以及（b）处理器，被配置为响应于所述第一和第二粒子而产生所述区域的至少一个图像。
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Patent Agency Ranking
公开(公告)号：US11790515B2
公开(公告)日：2023-10-17
申请号：US17751507
申请日：2022-05-23
Applicant: Applied Materials Israel Ltd.
Inventor： Irad Peleg , Ran Schleyen , Boaz Cohen
IPC: G06T7/00 , G06T7/11 , G06F18/22 , G06F18/214 , G06V10/82 , G06V10/44 , G06V20/69 , G01N21/95 , G06N3/06
CPC classification number: G06T7/0004 , G01N21/9501 , G06F18/214 , G06F18/22 , G06N3/06 , G06T7/0008 , G06T7/11 , G06V10/454 , G06V10/82 , G06V20/69 , G06T2207/10061 , G06T2207/20084 , G06T2207/30148
Abstract: A system for classifying a pattern of interest (POI) on a semiconductor specimen is disclosed. The system comprises a processor and memory circuitry. The memory circuitry is configured to obtain a high-resolution image of the POI, and to generate data usable for classifying the POI in accordance with a defectiveness-related classification. To generate the data, a machine learning model is utilized that has been trained in accordance with training samples. The training samples include a high-resolution training image captured by scanning a respective training pattern on a specimen, the respective training pattern being similar to the POI. The training samples also include a label associated with the image, the label being derivative of low-resolution inspection of the respective training pattern.
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公开(公告)号：US11449711B2
公开(公告)日：2022-09-20
申请号：US16733219
申请日：2020-01-02
Applicant: Applied Materials Israel Ltd.
Inventor： Ran Badanes , Ran Schleyen , Boaz Cohen , Irad Peleg , Denis Suhanov , Ore Shtalrid
Abstract: There is provided a method of defect detection on a specimen and a system thereof. The method includes: obtaining a runtime image representative of at least a portion of the specimen; processing the runtime image using a supervised model to obtain a first output indicative of the estimated presence of first defects on the runtime image; processing the runtime image using an unsupervised model component to obtain a second output indicative of the estimated presence of second defects on the runtime image; and combining the first output and the second output using one or more optimized parameters to obtain a defect detection result of the specimen.
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公开(公告)号：US11379972B2
公开(公告)日：2022-07-05
申请号：US16892139
申请日：2020-06-03
Applicant: Applied Materials Israel Ltd.
Inventor： Irad Peleg , Ran Schleyen , Boaz Cohen
Abstract: A system of classifying a pattern of interest (POI) on a semiconductor specimen, where the system includes a processor and memory circuitry configured to obtain a high-resolution image of the POI, and generate data usable for classifying the POI in accordance with a defectiveness-related classification. Generating the data utilizes a machine learning model that has been trained in accordance with training samples. The training samples include a high-resolution training image captured by scanning a respective training pattern on a specimen, the respective training pattern being similar to the POI, and a label associated with the image. The label is derivative of low-resolution inspection of the respective training pattern.
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公开(公告)号：US11151710B1
公开(公告)日：2021-10-19
申请号：US16866463
申请日：2020-05-04
Applicant: Applied Materials Israel Ltd.
Inventor： Ran Schleyen , Eyal Zakkay , Boaz Cohen
IPC: G06T7/00
Abstract: There is provided a system comprising a processor configured to obtain a set of images of a semiconductor specimen, (1) for an image of the set of images, select at least one algorithmic module MS out of a plurality of algorithmic modules, (2) feed the image to MS to obtain data DMS representative of one or more defects in the image, (3) obtain a supervised feedback regarding rightness of data DMS, (4) repeat (1) to (3) for a next image until a completion criterion is met, wherein an algorithmic module selected at (1) is different for at least two different images of the set of images, generate, based on the supervised feedback, a score for each of a plurality of the algorithmic modules, and use scores to identify one or more algorithmic modules Mbest as the most adapted for providing data representative of one or more defects in the set of images.
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公开(公告)号：US10340116B1
公开(公告)日：2019-07-02
申请号：US16007580
申请日：2018-06-13
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Ran Schleyen , Vladislav Kaplan , Shachar Paz
Abstract: A method, computer program product and a system for imaging an area that includes an upper surface and hole. The method may include acquiring, by a charged particle imager, a first image of a first type of electrons of the area while the charged particle imager is at a first configuration; acquiring, by the charged particle imager, a second image of the first type of electrons of the area and a first image of a second type of electrons of the area while the charged particle imager is at a second configuration that differs from the first configuration; and generating a hybrid image of the area based on (i) a first image of the first type of electrons of the upper surface, (ii) an inter-image offset, and (iii) a first image of the second type of electrons of the bottom of the hole.
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