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公开(公告)号:US08455293B2
公开(公告)日:2013-06-04
申请号:US13669550
申请日:2012-11-06
Applicant: ASM International N.V.
Inventor: Chris G. M. de Ridder , Klaas P. Boonstra , Adriaan Garssen , Frank Huussen
IPC: H01L21/00
CPC classification number: H01L21/67303 , C23C16/45546 , C23C16/4587 , F27B17/0025 , F27D5/0037 , H01L21/67109 , H01L21/67313 , H01L21/67757 , H01L31/1864 , H01L31/1876 , Y02E10/547 , Y02P70/521
Abstract: A method for processing solar cells comprising: providing a vertical furnace to receive an array of mutually spaced circular semiconductor wafers for integrated circuit processing; composing a process chamber loading configuration for solar cell substrates, wherein a size of the solar cell substrates that extends along a first surface to be processed is smaller than a corresponding size of the circular semiconductor wafers, such that multiple arrays of mutually spaced solar cell substrates can be accommodated in the process chamber, loading the solar cell substrates into the process chamber; subjecting the solar cell substrates to a process in the process chamber.
Abstract translation: 一种用于处理太阳能电池的方法,包括:提供垂直炉以接收用于集成电路处理的相互间隔开的圆形半导体晶片阵列; 构成用于太阳能电池基板的处理室装载构造,其中沿着待处理的第一表面延伸的太阳能电池基板的尺寸小于圆形半导体晶片的对应尺寸,使得相互间隔开的太阳能电池基板的多个阵列 可以容纳在处理室中,将太阳能电池基板装载到处理室中; 对太阳能电池基板进行处理室中的处理。
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公开(公告)号:US10858738B2
公开(公告)日:2020-12-08
申请号:US16366202
申请日:2019-03-27
Applicant: ASM International N.V.
IPC: C23C16/46 , C23C16/458
Abstract: A wafer boat cooldown device comprising a bottom plate and a rotatable table that is rotatable between a number of index positions. The rotatable table comprises at least two wafer boat positions for supporting a wafer boat. A vertically extending wall structure is mounted on the rotatable table and creates, at each wafer boat position, a wafer boat chamber having a gas supply area and a gas discharge area. The wafer boat cooldown device further comprises a plenum chamber which extends under the bottom plate. The plenum chamber accommodates at least one gas/liquid heat exchanger.
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公开(公告)号:US11121014B2
公开(公告)日:2021-09-14
申请号:US16000353
申请日:2018-06-05
Applicant: ASM International N.V.
Inventor: Chris G. M. de Ridder , Theodorus G. M. Oosterlaken , Adriaan Garssen
IPC: H01L21/673 , H01L21/677
Abstract: A dummy wafer storage cassette for storing dummy wafers. The dummy wafer storage cassette may have more than 30 wafer slots for accommodating dummy wafers. The dummy wafer cassette may have substantially the same outer dimensions as a standardized wafer cassette with 25 wafer slots and a pitch of the wafer slots of the dummy wafer storage cassette may be smaller than a pitch between the wafer slots in the standardized wafer cassette.
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公开(公告)号:US20130065352A1
公开(公告)日:2013-03-14
申请号:US13669550
申请日:2012-11-06
Applicant: ASM INTERNATIONAL N.V.
Inventor: Chris G. M. de Ridder , Klaas P. Boonstra , Adriaan Garssen , Frank Huussen
IPC: H01L31/0216
CPC classification number: H01L21/67303 , C23C16/45546 , C23C16/4587 , F27B17/0025 , F27D5/0037 , H01L21/67109 , H01L21/67313 , H01L21/67757 , H01L31/1864 , H01L31/1876 , Y02E10/547 , Y02P70/521
Abstract: A method for processing solar cells comprising: providing a vertical furnace to receive an array of mutually spaced circular semiconductor wafers for integrated circuit processing; composing a process chamber loading configuration for solar cell substrates, wherein a size of the solar cell substrates that extends along a first surface to be processed is smaller than a corresponding size of the circular semiconductor wafers, such that multiple arrays of mutually spaced solar cell substrates can be accommodated in the process chamber, loading the solar cell substrates into the process chamber; subjecting the solar cell substrates to a process in the process chamber.
Abstract translation: 一种用于处理太阳能电池的方法,包括:提供垂直炉以接收用于集成电路处理的相互间隔开的圆形半导体晶片阵列; 构成用于太阳能电池基板的处理室装载构造,其中沿着待处理的第一表面延伸的太阳能电池基板的尺寸小于圆形半导体晶片的对应尺寸,使得相互间隔开的太阳能电池基板的多个阵列 可以容纳在处理室中,将太阳能电池基板装载到处理室中; 对太阳能电池基板进行处理室中的处理。
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