公开(公告)号：USD958764S1

公开(公告)日：2022-07-26

申请号：US29782159

申请日：2021-05-04

Applicant: ASM IP HOLDING B.V.

Designer： Uday Kiran Rokkam ,  Sam Kim ,  Saket Rathi ,  Dakai Bian

公开(公告)号：US20240249970A1

公开(公告)日：2024-07-25

申请号：US18627178

申请日：2024-04-04

Applicant: ASM IP Holding B.V.

Inventor： Uday Kiran Rokkam ,  Sam Kim ,  Saket Rathi ,  Dakai Bian

IPC: H01L21/687

CPC classification number: H01L21/68735 ,  H01L21/6875 ,  H01L21/68785

Abstract: A susceptor can include a generally circular shape and may include an inner and outer susceptor. The outer susceptor can include a support region having one or more support mechanisms as well as a channel region extending from the region boundary to an outer radial boundary radially inward of an outer edge of the susceptor, the channel region can include a plurality of channels extending radially from the region boundary to the outer radial boundary.
The inner susceptor can include a second plurality of channels extending from the inner radial boundary to an edge of the inner susceptor.

公开(公告)号：US20190229008A1

公开(公告)日：2019-07-25

申请号：US16205899

申请日：2018-11-30

Applicant: ASM IP Holding B.V.

Inventor： Uday Kiran Rokkam ,  Eric Hill

IPC: H01L21/687

Abstract: A lift pin and a substrate support assembly and reactor including the lift pin are disclosed. The lift pin includes first section comprising a material having a first transparency and a second section comprising a material having a second transparency. The lift pin can provide improved temperature uniformity across substrate support assembly including the lift pin during substrate processing.

公开(公告)号：USD920936S1

公开(公告)日：2021-06-01

申请号：US29677173

申请日：2019-01-17

Applicant: ASM IP HOLDING B.V.

Designer： Uday Kiran Rokkam ,  Sam Kim ,  Saket Rathi ,  Dakai Bian

公开(公告)号：US11018047B2

公开(公告)日：2021-05-25

申请号：US16205899

申请日：2018-11-30

Applicant: ASM IP Holding B.V.

Inventor： Uday Kiran Rokkam ,  Eric Hill

IPC: H01L21/687

Abstract: A lift pin and a substrate support assembly and reactor including the lift pin are disclosed. The lift pin includes first section comprising a material having a first transparency and a second section comprising a material having a second transparency. The lift pin can provide improved temperature uniformity across substrate support assembly including the lift pin during substrate processing.

公开(公告)号：USD914620S1

公开(公告)日：2021-03-30

申请号：US29677183

申请日：2019-01-17

Applicant: ASM IP HOLDING B.V.

Designer： Uday Kiran Rokkam ,  Sam Kim ,  Saket Rathi ,  Dakai Bian