公开(公告)号：US20240218508A1

公开(公告)日：2024-07-04

申请号：US18609379

申请日：2024-03-19

Applicant: ASM IP Holding B.V.

Inventor： Aniket Nitin Patil ,  Saket Rathi ,  Sam Kim ,  Shiva K.T. Rajavelu Muralidhar

IPC: C23C16/455 ,  B23Q3/00 ,  C23C16/458 ,  C23C16/52

CPC classification number: C23C16/455 ,  B23Q3/00 ,  C23C16/4582 ,  C23C16/52

Abstract: A fixture is provided. The fixture includes a base, a turntable, a first sensor, and a second sensor. The turntable is supported on the base, is rotatable about a rotation axis, and is configured to slidably seat a susceptor assembly for rotation about the rotation axis. The first sensor is fixed relative to the base, is radially offset from the rotation axis, and is configured to determine ex-situ runout of the susceptor assembly. The second sensor is fixed relative to the first sensor, is axially offset from the first sensor, and is configured to determine ex-situ wobble of the susceptor assembly. Fixture arrangements and methods of determining ex-situ runout and ex-situ wobble of susceptor assemblies for semiconductor processing systems are also described.

公开(公告)号：US20240044792A1

公开(公告)日：2024-02-08

申请号：US18379312

申请日：2023-10-12

Applicant: ASM IP Holding B.V.

Inventor： Shiva K.T. Rajavelu Muralidhar ,  Youness Alvandi-Tabrizi ,  John DiSanto ,  Sam Kim

IPC: G01N21/59 ,  G01N21/958 ,  G01B11/02 ,  G01N33/207

CPC classification number: G01N21/59 ,  G01N21/958 ,  G01B11/028 ,  G01N33/207 ,  G01N2201/021

Abstract: Methods and apparatus for measuring light intensity are disclosed. The methods and apparatus can be used to verify an article, such as a reaction chamber. Exemplary apparatus include a first arm, a light source coupled to the first arm, a second arm, and a sensor coupled to the second arm. The sensor can receive light from the light source that is transmitted through at least a portion of the article.

公开(公告)号：USD958764S1

公开(公告)日：2022-07-26

申请号：US29782159

申请日：2021-05-04

Applicant: ASM IP HOLDING B.V.

Designer： Uday Kiran Rokkam ,  Sam Kim ,  Saket Rathi ,  Dakai Bian

公开(公告)号：US20220186369A1

公开(公告)日：2022-06-16

申请号：US17549022

申请日：2021-12-13

Applicant: ASM IP Holding B.V.

Inventor： Aniket Nitin Patil ,  Saket Rathi ,  Sam Kim ,  Shiva K.T. Rajavelu Muralidhar

IPC: C23C16/455 ,  C23C16/458 ,  C23C16/52

Abstract: A fixture is provided. The fixture includes a base, a turntable, a first sensor, and a second sensor. The turntable is supported on the base, is rotatable about a rotation axis, and is configured to slidably seat a susceptor assembly for rotation about the rotation axis. The first sensor is fixed relative to the base, is radially offset from the rotation axis, and is configured to determine ex-situ runout of the susceptor assembly. The second sensor is fixed relative to the first sensor, is axially offset from the first sensor, and is configured to determine ex-situ wobble of the susceptor assembly. Fixture arrangements and methods of determining ex-situ runout and ex-situ wobble of susceptor assemblies for semiconductor processing systems are also described.

公开(公告)号：US20210225671A1

公开(公告)日：2021-07-22

申请号：US17152241

申请日：2021-01-19

Applicant: ASM IP HOLDING B.V.

Inventor： Shiva K.T. Rajavelu Muralidhar ,  Sam Kim

IPC: H01L21/67 ,  H01L21/324 ,  H01K1/14 ,  H01K7/00 ,  H05B3/00 ,  F27B17/00

Abstract: An arrangement of linear heat lamps is provided which allows for localized control of temperature nonuniformities in a substrate during semiconductor processing. A reactor includes a substrate holder positioned between a top array and a bottom array of linear heat lamps. At least one lamp of the banks includes a filament having a varying density and power output along the length of the lamp. In particular, at least one lamp of the banks includes a filament having a higher filament winding density within a central portion of the lamp relative to peripheral portions of the lamp. In some embodiments, the at least one lamp is a central lamp extending across a central portion of the substrate heated by the lamp. Furthermore, at least one lamp of the banks has a higher power output within a central portion of the lamp than at peripheral portions of the lamp.

公开(公告)号：US20240133035A1

公开(公告)日：2024-04-25

申请号：US18402969

申请日：2024-01-03

Applicant: ASM IP Holding B.V.

Inventor： Shiva K.T. Rajavelu Muralidhar ,  Sam Kim ,  Jeffrey Barrett Robinson ,  James King Wilson, JR. ,  Ninad Vijay Sonje

IPC: C23C16/46 ,  C23C16/44 ,  C23C16/458 ,  H01L21/67 ,  H01L21/687

CPC classification number: C23C16/466 ,  C23C16/4411 ,  C23C16/4586 ,  H01L21/67201 ,  H01L21/68757

Abstract: A substrate retaining apparatus, a load lock assembly comprising the substrate retaining apparatus, and a system including the substrate retaining apparatus are disclosed. The substrate retaining apparatus can include at least one sidewall and one or more heat shields. One or more of the at least one sidewall can include a cooling fluid conduit to facilitate cooling of substrates retained by the substrate retaining apparatus. Additionally or alternatively, one or more of the at least one sidewall can include a gas conduit to provide gas to a surface of a retained substrate.

公开(公告)号：US20240096685A1

公开(公告)日：2024-03-21

申请号：US18509543

申请日：2023-11-15

Applicant: ASM IP Holding B.V.

Inventor： KiHyun Kim ,  Sam Kim ,  Rutvij Naik

IPC: H01L21/687 ,  B65G47/90

CPC classification number: H01L21/68707 ,  B65G47/90

Abstract: An adjustable joint for insertion into a linkage of a substrate handler utilized for substrate processing. The adjustable joint allows for adjusting the pitch and roll of an attached link. Such adjustment may permit aligning a pickup surface of an end effector to a desired plane. Once adjusted, the joint may be fixed to maintain the desired orientation of the attached link. The adjustable joint allows for correcting deflection of a pickup surface of an end effector relative to a desired pickup plane due to, for example, drooping caused by high temperature usage, mechanical tolerances and/or installation errors.

公开(公告)号：US20240055279A1

公开(公告)日：2024-02-15

申请号：US18496081

申请日：2023-10-27

Applicant: ASM IP Holding B.V.

Inventor： Shiva K.T. Rajavelu Muralidhar ,  Sam Kim

IPC: H01L21/67 ,  H01L21/324 ,  H01K1/14 ,  H05B3/00 ,  F27B17/00 ,  H01K7/00

CPC classification number: H01L21/67115 ,  H01L21/324 ,  H01K1/14 ,  H05B3/0047 ,  F27B17/0025 ,  H01K7/00 ,  F27D5/0037

Abstract: An arrangement of linear heat lamps is provided which allows for localized control of temperature nonuniformities in a substrate during semiconductor processing. A reactor includes a substrate holder positioned between a top array and a bottom array of linear heat lamps. At least one lamp of the arrays includes a filament having a varying density and power output along the length of the lamp. In particular, at least one lamp of the arrays includes a filament having a higher filament winding density within a central portion of the lamp relative to peripheral portions of the lamp. In some embodiments, the at least one lamp is a central lamp extending across a central portion of the substrate heated by the lamp. Furthermore, at least one lamp of the arrays has a higher power output within a central portion of the lamp than at peripheral portions of the lamp.

公开(公告)号：US20210239614A1

公开(公告)日：2021-08-05

申请号：US17157507

申请日：2021-01-25

Applicant: ASM IP Holding B.V.

Inventor： Shiva K.T. Rajavelu Muralidhar ,  Youness Alvandi-Tabrizi ,  John DiSanto ,  Sam Kim

IPC: G01N21/59

Abstract: Methods and apparatus for measuring light intensity are disclosed. The methods and apparatus can be used to verify an article, such as a reaction chamber. Exemplary apparatus include a first arm, a light source coupled to the first arm, a second arm, and a sensor coupled to the second arm. The sensor can receive light from the light source that is transmitted through at least a portion of the article.

公开(公告)号：US20200040458A1

公开(公告)日：2020-02-06

申请号：US16055532

申请日：2018-08-06

Applicant: ASM IP Holding B.V.

Inventor： Mingyang Ma ,  Junwei Su ,  Alexandros Demos ,  Xing Lin ,  Sam Kim ,  Gregory Michael Bartlett

IPC: C23C16/52 ,  C23C16/455 ,  C23C16/44 ,  H01J37/32 ,  B01J4/00

Abstract: A gas injection system, a reactor system including the gas injection system, and methods of using the gas injection system and reactor system are disclosed. The gas injection system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas injection system coupled to a reaction chamber.