公开(公告)号：US20230253238A1

公开(公告)日：2023-08-10

申请号：US18136559

申请日：2023-04-19

Applicant: ASM IP Holding B.V.

Inventor： JaeMin Roh ,  JuIll Lee ,  GunYong Park

IPC: H01L21/687 ,  H01L21/67

CPC classification number: H01L21/68764 ,  H01L21/6708

Abstract: A substrate support assembly arranged in a chamber includes: a support plate including a first surface on which a substrate is seated; a driver configured to tilt the support plate such that the first surface is inclined with respect to a reference surface by a lower inclination angle; and a controller configured to control the driver such that the lower inclination angle is adjusted based on an upper inclination angle formed by the inclination of the gas supplier coupled to the upper surface of the chamber with respect to the reference surface.

公开(公告)号：US20210013085A1

公开(公告)日：2021-01-14

申请号：US16922741

申请日：2020-07-07

Applicant: ASM IP Holding B.V.

Inventor： JaeMin Roh ,  JuIll Lee ,  GunYong Park

IPC: H01L21/687 ,  H01L21/67

Abstract: A substrate support assembly arranged in a chamber includes: a support plate including a first surface on which a substrate is seated; a driver configured to tilt the support plate such that the first surface is inclined with respect to a reference surface by a lower inclination angle; and a controller configured to control the driver such that the lower inclination angle is adjusted based on an upper inclination angle formed by the inclination of the gas supplier coupled to the upper surface of the chamber with respect to the reference surface.

公开(公告)号：US12107000B2

公开(公告)日：2024-10-01

申请号：US18136559

申请日：2023-04-19

Applicant: ASM IP Holding B.V.

Inventor： JaeMin Roh ,  JuIll Lee ,  GunYong Park

IPC: H01L21/68 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/68764 ,  H01L21/6708

Abstract: A substrate support assembly arranged in a chamber includes: a support plate including a first surface on which a substrate is seated; a driver configured to tilt the support plate such that the first surface is inclined with respect to a reference surface by a lower inclination angle; and a controller configured to control the driver such that the lower inclination angle is adjusted based on an upper inclination angle formed by the inclination of the gas supplier coupled to the upper surface of the chamber with respect to the reference surface.

公开(公告)号：US11664267B2

公开(公告)日：2023-05-30

申请号：US16922741

申请日：2020-07-07

Applicant: ASM IP Holding B.V.

Inventor： JaeMin Roh ,  Julll Lee ,  GunYong Park

IPC: H01L21/68 ,  H01L21/687 ,  H01L21/67

CPC classification number: H01L21/68764 ,  H01L21/6708

Abstract: A substrate support assembly arranged in a chamber includes: a support plate including a first surface on which a substrate is seated; a driver configured to tilt the support plate such that the first surface is inclined with respect to a reference surface by a lower inclination angle; and a controller configured to control the driver such that the lower inclination angle is adjusted based on an upper inclination angle formed by the inclination of the gas supplier coupled to the upper surface of the chamber with respect to the reference surface.