公开(公告)号：US11251068B2

公开(公告)日：2022-02-15

申请号：US16601593

申请日：2019-10-15

Applicant: ASM IP Holding B.V.

Inventor： JaeMin Roh ,  DaeYoun Kim ,  Julll Lee ,  ChangMin Lee

IPC: H01L21/687 ,  H01L21/68 ,  H01J37/32

Abstract: A substrate processing apparatus capable of improving thin film uniformity on a substrate by controlling the position of a substrate supporting apparatus includes a plurality of reactors, wherein each of the reactors includes a substrate supporting apparatus; a ring surrounding the substrate supporting apparatus; and an alignment device for moving the substrate supporting apparatus, wherein the ring is installed such that one surface of the ring comes in contact with the substrate supporting apparatus as the substrate supporting apparatus moves and the ring is movable by a pushing force of the substrate supporting apparatus.

公开(公告)号：US11664267B2

公开(公告)日：2023-05-30

申请号：US16922741

申请日：2020-07-07

Applicant: ASM IP Holding B.V.

Inventor： JaeMin Roh ,  Julll Lee ,  GunYong Park

IPC: H01L21/68 ,  H01L21/687 ,  H01L21/67

CPC classification number: H01L21/68764 ,  H01L21/6708

Abstract: A substrate support assembly arranged in a chamber includes: a support plate including a first surface on which a substrate is seated; a driver configured to tilt the support plate such that the first surface is inclined with respect to a reference surface by a lower inclination angle; and a controller configured to control the driver such that the lower inclination angle is adjusted based on an upper inclination angle formed by the inclination of the gas supplier coupled to the upper surface of the chamber with respect to the reference surface.

公开(公告)号：USD876504S1

公开(公告)日：2020-02-25

申请号：US29604101

申请日：2017-05-15

Applicant: ASM IP Holding B.V.

Designer： Julll Lee ,  Sung Hoon Jun ,  Dong Rak Jung ,  Seung Wook Kim