公开(公告)号：US20170044665A1

公开(公告)日：2017-02-16

申请号：US15208114

申请日：2016-07-12

Applicant: ASM IP Holding B.V.

Inventor： Jong Won SHON ,  Dae Youn KIM ,  Sang Don Lee ,  Hyun Soo JANG

IPC: C23C16/458 ,  C23C16/50 ,  C23C16/44 ,  C23C16/455

CPC classification number: C23C16/4412 ,  C23C16/4401 ,  C23C16/45544 ,  C23C16/5096 ,  H01J37/3244 ,  H01J37/32458 ,  H01J37/32568 ,  H01J37/32715 ,  H01J37/32834

Abstract: A deposition apparatus includes: a substrate support having a main surface on which a substrate is placed; a body disposed on the main surface and including a hollow portion having an exposed upper portion; a plasma electrode unit provided at a inner circumferential surface of the body to separate the hollow portion into an upper space and a lower space; and a gas supply unit supplying process gas to the plasma electrode unit, wherein a gas exhaust channel extending from the lower space to an exhaust outlet provided at a top of the body is formed in the body.

Abstract translation: 沉积设备包括：具有其上放置基板的主表面的基板支撑件; 主体，其设置在所述主表面上并且包括具有暴露的上部的中空部; 设置在所述主体的内周面的等离子体电极单元，以将所述中空部分分离成上部空间和下部空间; 以及气体供给单元，其向所述等离子体电极单元供给处理气体，其中，在所述体内形成有从所述下部空间延伸到设置在所述体的顶部的排气口的排气通道。