FLOW CONTROL ARRANGEMENTS WITH BYPASS SWITCHES, SEMICONDUCTOR PROCESSING SYSTEMS, AND RELATED FLOW CONTROL METHODS

    公开(公告)号:US20240019880A1

    公开(公告)日:2024-01-18

    申请号:US18351295

    申请日:2023-07-12

    CPC classification number: G05D7/0688 G05B19/054 G05B19/058

    Abstract: A flow control arrangement includes a housing seating inlet and outlet conduits, an isolation valve arranged within the housing and is connected to the inlet conduit, a flow switch, and a bypass switch. The flow switch has a shutoff trigger, is arranged within the housing, and couples the isolation valve to the outlet conduit. The bypass switch is coupled to the isolation valve and has first and second positions. The flow switch is operably coupled to the isolation valve when the bypass switch is in the first position to close the isolation valve when flow rate of fluid traversing the flow switch rises above the shutoff trigger, and is operably decoupled from the isolation valve when the bypass switch is in the second position to flow fluid through the flow switch at flow rates greater than the shutoff trigger. Semiconductor processing systems and related flow control methods are also described.

    SYSTEMS AND METHODS OF CONTROLLING GAS FLOWS IN SEMICONDUCTOR PROCESSING SYSTEMS

    公开(公告)号:US20220380900A1

    公开(公告)日:2022-12-01

    申请号:US17750875

    申请日:2022-05-23

    Abstract: A gas system includes an enclosure, a process gas metering valve, a shutoff valve, and a flow switch. The process gas metering valve arranged within the enclosure to flow a process gas to a process chamber of a semiconductor processing system. The shutoff valve is connected to the process gas metering valve to fluidly separate the process gas metering valve from a process gas source. The flow switch is operably connected to the shutoff valve to cease flow of the process gas to the process chamber of the semiconductor processing system using the shutoff valve according to flow of a gas traversing the flow switch. Semiconductor processing systems, gas control methods, and gas system kits are also described.

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