公开(公告)号：US20200173020A1

公开(公告)日：2020-06-04

申请号：US16785263

申请日：2020-02-07

Applicant: ASM IP Holding B.V.

Inventor： Robert Huggare

IPC: C23C16/455 ,  H01L21/687 ,  C23C16/458 ,  H01J37/32 ,  H01L21/67 ,  H01L21/677 ,  C23C16/44

Abstract: The disclosure relates to a chemical deposition, treatment and/or infiltration apparatus for providing a chemical reaction on and/or in a surface of a substrate. The apparatus may have a top and a bottom reaction chamber part forming together a closable reaction chamber and an actuator constructed and arranged for moving the top and bottom reaction chamber parts with respect to each other from a closed position to an open position so as to allow access to an interior of the reaction chamber. A top substrate holder is connected to the top reaction chamber part to hold a substrate at least when the reaction chamber is in the open position and a bottom substrate holder is connected to the bottom reaction chamber part to hold the substrate when the reaction chamber is in the closed position.

公开(公告)号：US10590535B2

公开(公告)日：2020-03-17

申请号：US15660797

申请日：2017-07-26

Applicant: ASM IP Holding B.V.

Inventor： Robert Huggare

IPC: C23C16/455 ,  H01L21/687 ,  C23C16/458 ,  H01J37/32 ,  H01L21/67 ,  H01L21/677 ,  C23C16/44

Abstract: The disclosure relates to a chemical deposition, treatment and/or infiltration apparatus for providing a chemical reaction on and/or in a surface of a substrate. The apparatus may have a top and a bottom reaction chamber part forming together a closable reaction chamber and an actuator constructed and arranged for moving the top and bottom reaction chamber parts with respect to each other from a closed position to an open position so as to allow access to an interior of the reaction chamber. A top substrate holder is connected to the top reaction chamber part to hold a substrate at least when the reaction chamber is in the open position and a bottom substrate holder is connected to the bottom reaction chamber part to hold the substrate when the reaction chamber is in the closed position.

公开(公告)号：US20190032209A1

公开(公告)日：2019-01-31

申请号：US15660797

申请日：2017-07-26

Applicant: ASM IP Holding B.V.

Inventor： Robert Huggare

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/458

CPC classification number: C23C16/45544 ,  C23C16/4408 ,  C23C16/4583 ,  C23C16/4586 ,  H01J37/32568 ,  H01J37/32724 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67748 ,  H01L21/68735

Abstract: The disclosure relates to a chemical deposition, treatment and/or infiltration apparatus for providing a chemical reaction on and/or in a surface of a substrate. The apparatus may have a top and a bottom reaction chamber part forming together a closable reaction chamber and an actuator constructed and arranged for moving the top and bottom reaction chamber parts with respect to each other from a closed position to an open position so as to allow access to an interior of the reaction chamber. A top substrate holder is connected to the top reaction chamber part to hold a substrate at least when the reaction chamber is in the open position and a bottom substrate holder is connected to the bottom reaction chamber part to hold the substrate when the reaction chamber is in the closed position.

公开(公告)号：US11802338B2

公开(公告)日：2023-10-31

申请号：US16785263

申请日：2020-02-07

Applicant: ASM IP Holding B.V.

Inventor： Robert Huggare

IPC: C23C16/455 ,  C23C16/458 ,  H01L21/677 ,  H01L21/687 ,  C23C16/44 ,  H01J37/32 ,  H01L21/67

CPC classification number: C23C16/45544 ,  C23C16/4408 ,  C23C16/4583 ,  C23C16/4586 ,  H01J37/32568 ,  H01J37/32724 ,  H01L21/6719 ,  H01L21/67126 ,  H01L21/67748 ,  H01L21/68735

Abstract: The disclosure relates to a chemical deposition, treatment and/or infiltration apparatus for providing a chemical reaction on and/or in a surface of a substrate. The apparatus may have a top and a bottom reaction chamber part forming together a closable reaction chamber and an actuator constructed and arranged for moving the top and bottom reaction chamber parts with respect to each other from a closed position to an open position so as to allow access to an interior of the reaction chamber. A top substrate holder is connected to the top reaction chamber part to hold a substrate at least when the reaction chamber is in the open position and a bottom substrate holder is connected to the bottom reaction chamber part to hold the substrate when the reaction chamber is in the closed position.