公开(公告)号：US20210254216A1

公开(公告)日：2021-08-19

申请号：US17171793

申请日：2021-02-09

Applicant: ASM IP Holding B.V.

Inventor： Yukihiro Mori ,  Vincent Hubert Bernard Gilles Babin ,  Naoto Tsuji

IPC: C23C16/455 ,  C23C16/40

Abstract: A gas distribution assembly and methods for adjusting the gas flow through a gas supply unit into a reaction chamber are disclosed. The gas distribution assembly and methods can be used to increase or decrease gas flow uniformly through the gas supply unit. The gas distribution assembly and methods can also be used to increase gas flow into one area of the reaction chamber, while decreasing gas flow into another area.

公开(公告)号：US20230069637A1

公开(公告)日：2023-03-02

申请号：US17897827

申请日：2022-08-29

Applicant: ASM IP Holding B.V.

Inventor： Wei Chen Liao ,  Vincent Hubert Bernard Gilles Babin

IPC: C23C16/455 ,  F16B1/00

Abstract: A gas distribution assembly and method for reducing the eccentricity between a shower plate and an exhaust duct are disclosed. The gas distribution assembly includes positioning devices configured to reduce misalignment between the shower plate and the exhaust duct. The gas distribution assembly and method can be used to improve uniformity of film deposition thickness.