公开(公告)号：US20230366082A1

公开(公告)日：2023-11-16

申请号：US18195456

申请日：2023-05-10

Applicant: ASM IP Holding B.V.

Inventor： Jun Yoshikawa ,  Wei Chen Liao

IPC: C23C16/44 ,  C23C16/458 ,  C23C16/455 ,  C23C16/50

CPC classification number: C23C16/4412 ,  C23C16/4586 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/45536

Abstract: A film forming apparatus includes a chamber, a susceptor placed in the chamber, an electrode placed inside the susceptor, a conductive shower head arranged above the susceptor apart from each other, an annular exhaust duct arranged so as to surround the outer edge of the susceptor, and an AC power supply that supplies AC power to the electrode, wherein the annular exhaust duct has an exhaust gas introduction member having an exhaust gas inlet and an exhaust gas discharge member having an exhaust gas outlet, the exhaust gas introduction member is arranged on the susceptor side in the radial direction of the susceptor and is made of an insulating material, and the exhaust gas discharge member is arranged on the side opposite to the susceptor side in the radial direction of the susceptor, and is made of a conductive material.

公开(公告)号：US20230407477A1

公开(公告)日：2023-12-21

申请号：US18209659

申请日：2023-06-14

Applicant: ASM IP Holding B.V.

Inventor： Wei Chen Liao

IPC: C23C16/455

CPC classification number: C23C16/45553 ,  C23C16/45565 ,  C23C16/4558 ,  C23C16/45536 ,  C23C16/45551

Abstract: A substrate processing apparatus unit is disclosed. Exemplary substrate processing apparatus includes a reaction chamber provided with a reaction space; a susceptor disposed in the reaction chamber and configured to support a substrate, wherein the susceptor is configured to be vertically movable between a process position and a transfer position; a shower plate provided above the susceptor and configured to provide the reaction space with a gas; a gas exhaust unit configured to exhaust the gas from the reaction chamber, comprising: an exhaust duct surrounds the shower plate and provided with a main duct; a first flow control ring that surrounds the susceptor with a space when the susceptor is in the process position; and a second flow control ring surrounds the first flow control ring; wherein a first exhaust channel is formed between the exhaust duct and the first flow control ring; wherein a second exhaust channel is formed between the first flow control ring and the second control ring, and the second exhaust channel is fluidly connected to the main duct and an area below the susceptor.

公开(公告)号：US20230069637A1

公开(公告)日：2023-03-02

申请号：US17897827

申请日：2022-08-29

Applicant: ASM IP Holding B.V.

Inventor： Wei Chen Liao ,  Vincent Hubert Bernard Gilles Babin

IPC: C23C16/455 ,  F16B1/00

Abstract: A gas distribution assembly and method for reducing the eccentricity between a shower plate and an exhaust duct are disclosed. The gas distribution assembly includes positioning devices configured to reduce misalignment between the shower plate and the exhaust duct. The gas distribution assembly and method can be used to improve uniformity of film deposition thickness.