公开(公告)号：US20240371662A1

公开(公告)日：2024-11-07

申请号：US18651935

申请日：2024-05-01

Applicant: ASM IP Holding B.V.

Inventor： Rajkumar Jakkaraju ,  Paul Ma ,  Yi Zhang ,  Dong Li

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/687

Abstract: Described herein are example, method, system and apparatus for supporting a substrate in a chamber wherein the substrate comprises a surface, contacting the surface of the substrate with an excited species within the chamber, contacting the surface of the substrate with an etchant species within the chamber and removing organic residue or non-organic residue, or a combination thereof, from the surface of the substrate responsive to executing the above steps.