公开(公告)号：US11520241B2

公开(公告)日：2022-12-06

申请号：US16768766

申请日：2018-11-29

Applicant: ASML HOLDING N.V.

Inventor： Matthew Lipson ,  David Allen Heald ,  Iliya Sigal

IPC: G03F7/20 ,  H01L21/687

Abstract: Methods and systems are described for reducing adhesion and controlling friction between a wafer and a wafer table during semiconductor photolithography wherein the tops of burls on the wafer table have a layer with a nanoscale topography.

公开(公告)号：US11988971B2

公开(公告)日：2024-05-21

申请号：US17612679

申请日：2020-05-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Matthew Lipson ,  Satish Achanta ,  Benjamin David Dawson ,  Matthew Anthony Sorna ,  Iliya Sigal ,  Tammo Uitterdijk

IPC: G03F7/00

CPC classification number: G03F7/70716

Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

公开(公告)号：US11270906B2

公开(公告)日：2022-03-08

申请号：US16756907

申请日：2018-10-04

Applicant: ASML HOLDING N.V.

Inventor： Mehmet Ali Akbas ,  David Hart Peterson ,  Tammo Uitterdijk ,  Michael Perry ,  Richard Bryan Lewis ,  Iliya Sigal

IPC: H01L21/687 ,  G03F7/20

Abstract: Various burl designs for holding an object in a lithographic apparatus are described. A lithographic apparatus includes an illumination system, a first support structure, a second support structure, and a projection system. The illumination system is designed to receive radiation and to direct the radiation towards a patterning device that forms patterned radiation. The first support structure is designed to support the patterning device on the first support structure. The second support structure has a plurality of burls and is designed to support the substrate on the plurality of burls. A topography of a top surface of each of the plurality of burls is not substantially flat, such that a contact area between the substrate and each of the plurality of burls is reduced. The projection system is designed to receive the patterned radiation and to direct the patterned radiation towards the substrate.