公开(公告)号：US11422289B2

公开(公告)日：2022-08-23

申请号：US16500546

申请日：2018-03-13

Applicant: ASML Holding N.V.

Inventor： Parag Vinayak Kelkar ,  David Hart Peterson

IPC: G02B1/111 ,  G03F7/20

Abstract: A method of forming an anti-reflection layer, the method including applying a first mixture to an object, the first mixture made from a combination of aluminum tri-sec-butoxide (ATSB), a first chelating agent, water and an alcohol; removing a majority of the alcohol from the applied first mixture; after the removing, applying a second mixture to the object, the second mixture made from a combination of aluminum tri-sec-butoxide, a second chelating agent different than the first chelating agent, water and an alcohol; and removing a majority of the alcohol from the applied second mixture, wherein the applied first and second mixtures are used to form the anti-reflection layer.

公开(公告)号：US11887881B2

公开(公告)日：2024-01-30

申请号：US17608238

申请日：2020-04-21

Applicant: ASML HOLDING N.V.

Inventor： Bruce Tirri ,  Ping Zhou ,  Elizabeth Mary Stone ,  David Hart Peterson ,  Mehmet Ali Akbas ,  Ryan Mayer ,  Richard Bryan Lewis

IPC: G03F7/00 ,  H01L21/687 ,  C23C16/513

CPC classification number: H01L21/68735 ,  C23C16/513 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/68757

Abstract: A method of fabricating a substrate table includes supporting a table base and disposing a coating on a surface of the table base. The surface of the table base is substantially flat. The coating has a non-uniform thickness. The coating exerts a stress on the table so as to bend the table base. The non-uniform thickness causes a surface of the coating to become substantially flat after the bending.

公开(公告)号：US12111581B2

公开(公告)日：2024-10-08

申请号：US17291086

申请日：2019-10-22

Applicant: ASML Holding N.V.

Inventor： Mehmet Ali Akbas ,  Tammo Uitterdijk ,  Christopher John Mason ,  Matthew Lipson ,  David Hart Peterson ,  Michael Perry ,  Peter Helmus ,  Jerry Jianguo Deng ,  Damoon Sohrabibabaheidary

IPC: G03F7/20 ,  G03F7/00 ,  H01L21/687

CPC classification number: G03F7/707 ,  G03F7/70491 ,  H01L21/6875

Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.

公开(公告)号：US11270906B2

公开(公告)日：2022-03-08

申请号：US16756907

申请日：2018-10-04

Applicant: ASML HOLDING N.V.

Inventor： Mehmet Ali Akbas ,  David Hart Peterson ,  Tammo Uitterdijk ,  Michael Perry ,  Richard Bryan Lewis ,  Iliya Sigal

IPC: H01L21/687 ,  G03F7/20

Abstract: Various burl designs for holding an object in a lithographic apparatus are described. A lithographic apparatus includes an illumination system, a first support structure, a second support structure, and a projection system. The illumination system is designed to receive radiation and to direct the radiation towards a patterning device that forms patterned radiation. The first support structure is designed to support the patterning device on the first support structure. The second support structure has a plurality of burls and is designed to support the substrate on the plurality of burls. A topography of a top surface of each of the plurality of burls is not substantially flat, such that a contact area between the substrate and each of the plurality of burls is reduced. The projection system is designed to receive the patterned radiation and to direct the patterned radiation towards the substrate.