公开(公告)号：US10908518B2

公开(公告)日：2021-02-02

申请号：US15984040

申请日：2018-05-18

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. Delpuerto ,  Antonius Franciscus Johannes De Groot ,  Kenneth C. Henderson ,  Raymond Wilhelmus Louis Lafarre ,  Matthew Lipson ,  Louis John Markoya ,  Tammo Uitterdijk ,  Ronald Van Der Wilk ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/687

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：US10310391B2

公开(公告)日：2019-06-04

申请号：US15504749

申请日：2015-07-09

Applicant: ASML Holding N.V.

Inventor： Matthew Lipson ,  Vincent Dimilia ,  Ronald Peter Totillo ,  Tammo Uitterdijk ,  Steven Michael Zimmerman

IPC: G03B27/58 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  C03B23/20 ,  C03B25/02

Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.

公开(公告)号：US11988971B2

公开(公告)日：2024-05-21

申请号：US17612679

申请日：2020-05-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Matthew Lipson ,  Satish Achanta ,  Benjamin David Dawson ,  Matthew Anthony Sorna ,  Iliya Sigal ,  Tammo Uitterdijk

IPC: G03F7/00

CPC classification number: G03F7/70716

Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

公开(公告)号：US10001713B2

公开(公告)日：2018-06-19

申请号：US14762452

申请日：2014-02-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. Del Puerto ,  Matthew Lipson ,  Kenneth C. Henderson ,  Raymond Wilhelmus Louis LaFarre ,  Louis John Markoya ,  Tammo Uitterdijk ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Antonius Franciscus Johannes De Groot ,  Ronald Van Der Wilk

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：US12235592B2

公开(公告)日：2025-02-25

申请号：US18008283

申请日：2021-06-09

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Koos Van Berkel ,  Marcus Adrianus Van De Kerkhof ,  Roger Franciscus Mattheus Maria Hamelinck ,  Shahab Shervin ,  Marinus Augustinus Christiaan Verschuren ,  Johannes Bernardus Charles Engelen ,  Matthias Kruizinga ,  Tammo Uitterdijk ,  Oleksiy Sergiyovich Galaktionov ,  Kjeld Gertrudus Hendrikus Janssen ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Peter Van Delft

IPC: G03F7/00

Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

公开(公告)号：US12111581B2

公开(公告)日：2024-10-08

申请号：US17291086

申请日：2019-10-22

Applicant: ASML Holding N.V.

Inventor： Mehmet Ali Akbas ,  Tammo Uitterdijk ,  Christopher John Mason ,  Matthew Lipson ,  David Hart Peterson ,  Michael Perry ,  Peter Helmus ,  Jerry Jianguo Deng ,  Damoon Sohrabibabaheidary

IPC: G03F7/20 ,  G03F7/00 ,  H01L21/687

CPC classification number: G03F7/707 ,  G03F7/70491 ,  H01L21/6875

Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.

公开(公告)号：USRE49066E1

公开(公告)日：2022-05-10

申请号：US16804549

申请日：2020-02-28

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Michael Leo Nelson ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Geoffrey O'Connor ,  Michael Andrew Chieda ,  Tammo Uitterdijk

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/67

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.

公开(公告)号：US11270906B2

公开(公告)日：2022-03-08

申请号：US16756907

申请日：2018-10-04

Applicant: ASML HOLDING N.V.

Inventor： Mehmet Ali Akbas ,  David Hart Peterson ,  Tammo Uitterdijk ,  Michael Perry ,  Richard Bryan Lewis ,  Iliya Sigal

IPC: H01L21/687 ,  G03F7/20

Abstract: Various burl designs for holding an object in a lithographic apparatus are described. A lithographic apparatus includes an illumination system, a first support structure, a second support structure, and a projection system. The illumination system is designed to receive radiation and to direct the radiation towards a patterning device that forms patterned radiation. The first support structure is designed to support the patterning device on the first support structure. The second support structure has a plurality of burls and is designed to support the substrate on the plurality of burls. A topography of a top surface of each of the plurality of burls is not substantially flat, such that a contact area between the substrate and each of the plurality of burls is reduced. The projection system is designed to receive the patterned radiation and to direct the patterned radiation towards the substrate.

公开(公告)号：US10324383B2

公开(公告)日：2019-06-18

申请号：US15764594

申请日：2016-10-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Michael Leo Nelson ,  Jacobus Cornelius Gerardus Van Der Sanden ,  Geoffrey O'Connor ,  Michael Andrew Chieda ,  Tammo Uitterdijk

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/67

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.

公开(公告)号：US10274842B2

公开(公告)日：2019-04-30

申请号：US15504749

申请日：2015-07-09

Applicant: ASML Holding N.V.

Inventor： Matthew Lipson ,  Vincent Dimilia ,  Ronald Peter Totillo ,  Tammo Uitterdijk ,  Steven Michael Zimmerman

IPC: G03B27/58 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  C03B23/20 ,  C03B25/02

Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.