公开(公告)号：US09632433B2

公开(公告)日：2017-04-25

申请号：US14439359

申请日：2013-10-21

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William Ebert, Jr. ,  Johannes Onvlee ,  Samir A. Nayfeh ,  Mark Josef Schuster ,  Peter A. Delmastro ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Abdullah Alikhan ,  Daniel Nathan Burbank ,  Daniel Nicholas Galburt ,  Justin Matthew Verdirame

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US10423081B2

公开(公告)日：2019-09-24

申请号：US15540649

申请日：2015-12-02

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Thomas Venturino ,  Geoffrey Alan Schultz ,  Daniel Nicholas Galburt ,  Daniel Nathan Burbank ,  Santiago E. Delpuerto ,  Herman Vogel ,  Johannes Onvlee ,  Laurentius Johannes Adrianus Van Bokhoven ,  Christopher Charles Ward

IPC: G03F7/20

Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.

公开(公告)号：US09632434B2

公开(公告)日：2017-04-25

申请号：US14699468

申请日：2015-04-29

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William Ebert, Jr. ,  Johannes Onvlee ,  Samir A. Nayfeh ,  Mark Josef Schuster ,  Peter A. Delmastro ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Abdullah Alikhan ,  Daniel Nathan Burbank ,  Daniel Nicholas Galburt ,  Justin Matthew Verdirame ,  Thomas Venturino

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

公开(公告)号：US09977351B2

公开(公告)日：2018-05-22

申请号：US15649161

申请日：2017-07-13

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William Ebert ,  Johannes Onvlee ,  Samir A. Nayfeh ,  Mark Josef Schuster ,  Peter A. Delmastro ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Abdullah Alikhan ,  Daniel Nathan Burbank ,  Daniel Nicholas Galburt ,  Justin Matthew Verdirame

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US09766557B2

公开(公告)日：2017-09-19

申请号：US15438376

申请日：2017-02-21

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William Ebert ,  Johannes Onvlee ,  Samir A. Nayfeh ,  Mark Josef Schuster ,  Peter A. Delmastro ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Abdullah Alikhan ,  Daniel Nathan Burbank ,  Daniel Nicholas Galburt ,  Justin Matthew Verdirame

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.