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公开(公告)号：US10031428B2
公开(公告)日：2018-07-24
申请号：US14762450
申请日：2014-02-20
发明人： Koen Cuypers , Marcelo Henrique De Andrade Oliveira , Marinus Jan Remie , Chattarbir Singh , Laurentius Johannes Adrianus Van Bokhoven , Henricus Anita Jozef Wilhemus Van De Ven , José Nilton Fonseca Junior , Frank Johannes Jacobus Van Boxtel , Daniel Nathan Burbank , Erik Roelof Loopstra , Johannes Onvlee , Mark Josef Schuster , Robertus Nicodemus Jacobus Van Ballegoij , Christopher Charles Ward , Jan Steven Christiaan Westerlaken
摘要： A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
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公开(公告)号：US09632433B2
公开(公告)日：2017-04-25
申请号：US14439359
申请日：2013-10-21
发明人： Earl William Ebert, Jr. , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
摘要： A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US09632434B2
公开(公告)日：2017-04-25
申请号：US14699468
申请日：2015-04-29
发明人： Earl William Ebert, Jr. , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame , Thomas Venturino
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
摘要： A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.
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公开(公告)号：US10394139B2
公开(公告)日：2019-08-27
申请号：US16090713
申请日：2017-03-08
发明人： Güneş Nak{dot over (i)}bo{hacek over (g)}lu , Lowell Lane Baker , Ruud Hendrikus Martinus Johannes Bloks , Hakki Ergün Cekli , Geoffrey Alan Schultz , Laurentius Johannes Adrianus Van Bokhoven , Frank Johannes Jacobus Van Boxtel , Jean-Philippe Xavier Van Damme , Christopher Charles Ward
IPC分类号： G03F7/20
摘要： A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
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公开(公告)号：US20150168854A1
公开(公告)日：2015-06-18
申请号：US14411870
申请日：2013-06-05
发明人： Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
摘要翻译： 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。
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公开(公告)号：US10788763B2
公开(公告)日：2020-09-29
申请号：US15354821
申请日：2016-11-17
发明人： Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
摘要： A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
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公开(公告)号：US09977351B2
公开(公告)日：2018-05-22
申请号：US15649161
申请日：2017-07-13
发明人： Earl William Ebert , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
摘要： A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US09766557B2
公开(公告)日：2017-09-19
申请号：US15438376
申请日：2017-02-21
发明人： Earl William Ebert , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
摘要： A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US09513568B2
公开(公告)日：2016-12-06
申请号：US14411870
申请日：2013-06-05
发明人： Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
CPC分类号： G03F7/70875 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
摘要翻译： 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。
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公开(公告)号：US20200379360A1
公开(公告)日：2020-12-03
申请号：US16071380
申请日：2017-01-26
发明人： Han-Kwang Nienhuys , Gunes Nakiboglu , Rita Marguerite Albin Lambertine Petit , Hermen Folken Pen , Remco Yuri Van de Moesdijk , Frank Johannes Jacobus Van Boxtel , Borgert Kruizinga
摘要： A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.
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