RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
    1.
    发明申请
    RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 有权
    辐射源和光刻设备

    公开(公告)号:US20160195819A1

    公开(公告)日:2016-07-07

    申请号:US14910995

    申请日:2014-07-24

    Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.

    Abstract translation: 辐射源包括喷嘴,所述喷嘴构造成沿着液滴路径朝向等离子体形成位置引导燃料液滴流,并且被配置为接收具有预定波长并且沿着预定轨迹传播的具有高斯强度分布的高斯辐射束,以及 进一步配置成将辐射束聚焦在等离子体形成位置处的燃料液滴上。 辐射源包括包括一个或多个相位板的相位板结构。 相位板结构具有第一区和第二区。 这些区域布置成使得具有通过第一区域的预定波长的辐射和通过第二区域的具有预定波长的辐射沿着具有不同光程长度的各个光路传播。 光路长度之间的差是奇数倍的预定波长的一半。

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