公开(公告)号：US20210357566A1

公开(公告)日：2021-11-18

申请号：US17281123

申请日：2019-10-08

Applicant: ASML NETHERLAND B.V.

Inventor： Mark Christopher SIMMONS ,  Chenxi LIN ,  Jen-Yi WUU

IPC: G06F30/392 ,  G03F7/20 ,  G06N3/08 ,  G06N3/04

Abstract: A method of generating a characteristic pattern for a patterning process and training a machine learning model. The method for generating the characteristic pattern includes obtaining a trained generator model configured to generate a characteristic pattern (e.g., a hot spot pattern), and an input pattern; and generating, via simulation using the trained generator model (e.g., CNN), the characteristic pattern based on the input pattern, wherein the input pattern can be a random vector and/or a class of pattern.

公开(公告)号：US20160195819A1

公开(公告)日：2016-07-07

申请号：US14910995

申请日：2014-07-24

Applicant: ASML NETHERLAND B.V.

Inventor： Oscar Franciscus Jozephus NOORDMAN ,  Markus Franciscus Antonius EURLINGS

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70133 ,  G02B27/44 ,  G02B27/50 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/1307 ,  H01S3/2391 ,  H05G2/006 ,  H05G2/008

Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.

Abstract translation: 辐射源包括喷嘴，所述喷嘴构造成沿着液滴路径朝向等离子体形成位置引导燃料液滴流，并且被配置为接收具有预定波长并且沿着预定轨迹传播的具有高斯强度分布的高斯辐射束，以及 进一步配置成将辐射束聚焦在等离子体形成位置处的燃料液滴上。 辐射源包括包括一个或多个相位板的相位板结构。 相位板结构具有第一区和第二区。 这些区域布置成使得具有通过第一区域的预定波长的辐射和通过第二区域的具有预定波长的辐射沿着具有不同光程长度的各个光路传播。 光路长度之间的差是奇数倍的预定波长的一半。

公开(公告)号：US20150015863A1

公开(公告)日：2015-01-15

申请号：US14383359

申请日：2013-02-07

Applicant: ASML Netherland B.V.

Inventor： Antonius Theodorus Wilhelmus Kempen ,  John Frederik Dijkusman ,  Jan Jan Meastrom

IPC: H05G2/00 ,  B05B17/06 ,  G03F7/20

CPC classification number: H05G2/006 ,  B05B17/0653 ,  G03F7/70033 ,  G03F7/70058 ,  G03F7/7085 ,  G03F7/709 ,  G03F7/70916

Abstract: The present invention provides a method of monitoring the operation of a radiation source fuel droplet stream generator comprising a fuel-containing capillary and a piezo-electric actuator (500). The method comprises analysing the resonance frequency spectrum of a system comprising the fuel-containing capillary and the piezo-electric actuator in particular to look for changes in the resonance frequencies of the acoustic system which may be indicative of a change in the properties of the system requiring investigation.

Abstract translation: 本发明提供一种监测包括含燃料毛细管和压电致动器（500）的辐射源燃料液滴流发生器的操作的方法。 该方法包括分析包括含燃料的毛细管和压电致动器的系统的共振频谱，以寻找声学系统的共振频率的变化，其可以指示系统的性质的变化 需要调查。

公开(公告)号：US20140098357A1

公开(公告)日：2014-04-10

申请号：US14107734

申请日：2013-12-16

Applicant: ASML NETHERLAND B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Richard Joseph BRULS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Ronald Walther Jeanne SEVERIJNS ,  Sergei SHULEPOV ,  Herman BOOM ,  Timotheus Franciscus SENGERS

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

Abstract translation: 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

公开(公告)号：US20240003809A1

公开(公告)日：2024-01-04

申请号：US18038590

申请日：2021-10-12

Applicant: STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  ASML NETHERLAND B.V. ,  UNIVERSITEIT VAN AMSTERDAM

Inventor： Peter Michael KRAUS ,  Sylvianne Dorothea Christina ROSCAM ABBING ,  Filippo CAMPI ,  ZhuangYan ZHANG ,  Petrus Wilhelmus SMORENBURG ,  Nan LIN ,  Stefan Michiel WITTE ,  Arie Jeffrey DEN BOEF

IPC: G01N21/47 ,  G01B11/06 ,  G03F7/00

CPC classification number: G01N21/4788 ,  G01B11/0608 ,  G03F7/70625 ,  G03F7/706851 ,  G01N2201/0634

Abstract: Disclosed is a metrology apparatus and method for measurement of a diffractive structure on a substrate. The metrology apparatus comprises a radiation source operable to provide first radiation for excitation of the diffractive structure such that high harmonic second radiation is generated from said diffractive structure and/or substrate; and a detection arrangement operable to detect said second radiation, at least a portion of which having been diffracted by said diffractive structure.

公开(公告)号：US20170329232A1

公开(公告)日：2017-11-16

申请号：US15589958

申请日：2017-05-08

Applicant: ASML Netherland B.V.

Inventor： Sebastianus Adrianus GOORDEN ,  Teunis Willem Tukker ,  Johannes Matheus Marie De Wit ,  Jonas Mertes ,  Gerbrand Van Der Zouw

IPC: G03F7/20 ,  G03F7/26 ,  G03F7/16 ,  G01N21/88 ,  G01N21/47 ,  G01B11/27 ,  G03F7/38 ,  G01B11/06

CPC classification number: G03F7/70191 ,  G01B11/0608 ,  G01B11/272 ,  G01N21/4738 ,  G01N21/8851 ,  G02B27/0994 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  G03F7/70075

Abstract: Disclosed are an optical system for conditioning a beam of radiation, and an illumination system and metrology apparatus comprising such an optical system. The optical system comprises one or more optical mixing elements in an optical system. The optical system defines at least a first optical mixing stage, at least a second optical mixing stage, and at least one transformation stage, configured such that radiation entering the second optical mixing stage includes a transformed version of radiation exiting the first optical mixing stage. The first and second optical mixing stages can be provided using separate optical mixing elements, or by multiple passes through the same optical mixing element. The transformation stage can be a Fourier transformation stage. Both spatial distribution and angular distribution of illumination can be homogenized as desired.

公开(公告)号：US20250155824A1

公开(公告)日：2025-05-15

申请号：US19025718

申请日：2025-01-16

Applicant: ASML NETHERLAND B.V.

Inventor： Jingjing LIU ,  Duan-Fu Stephen HSU ,  Xingyue PENG

IPC: G03F7/00 ,  G05B19/4099

Abstract: A method for determining process window limiting patterns based on aberration sensitivity associated with a patterning apparatus. The method includes obtaining (i) a first set of kernels and a second set of kernels associated with an aberration wavefront of the patterning apparatus and (ii) a design layout to be printed on a substrate via the patterning apparatus; and determining, via a process simulation using the design layout, the first set of kernels, and the second set of kernels, an aberration sensitivity map associated with the aberration wavefront, the aberration sensitivity map indicating how sensitive one or more portions of the design layout are to an individual aberrations and an interaction between different aberrations; determining, based on the aberration sensitivity map, the process window limiting pattern associated with the design layout having relatively high sensitivity compared to other portions of the design layout.

公开(公告)号：US20220121804A1

公开(公告)日：2022-04-21

申请号：US17564837

申请日：2021-12-29

Applicant: ASML NETHERLAND B.V.

Inventor： Quan Zhang ,  Been-Der Chen ,  Rafael C. Howell ,  Jing Su ,  Yi Zou ,  Yen-Wen Lu

IPC: G06F30/398 ,  G03F1/36 ,  G03F1/70 ,  G03F7/20

Abstract: A method to determine a curvilinear pattern of a patterning device that includes obtaining (i) an initial image of the patterning device corresponding to a target pattern to be printed on a substrate subjected to a patterning process, and (ii) a process model configured to predict a pattern on the substrate from the initial image, generating, by a hardware computer system, an enhanced image from the initial image, generating, by the hardware computer system, a level set image using the enhanced image, and iteratively determining, by the hardware computer system, a curvilinear pattern for the patterning device based on the level set image, the process model, and a cost function, where the cost function (e.g., EPE) determines a difference between a predicted pattern and the target pattern, where the difference is iteratively reduced.

公开(公告)号：US20200302587A1

公开(公告)日：2020-09-24

申请号：US16895412

申请日：2020-06-08

Applicant: ASML Netherland B.V.

Inventor： Wei FANG ,  Zhao-li Zhang ,  Jack Jau

IPC: G06T7/00 ,  G06K9/46

Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.

公开(公告)号：US20180329311A1

公开(公告)日：2018-11-15

申请号：US15774583

申请日：2016-10-07

Applicant: ASML NETHERLAND B.V.

Inventor： Lin Lee CHEONG ,  Wenjin HUANG ,  Bruno LA FONTAINE

IPC: G03F7/20 ,  G05B19/4097

CPC classification number: G03F7/70625 ,  G03F7/70641 ,  G05B19/4097 ,  G05B2219/45028

Abstract: A method including: determining a value of a characteristic of a patterning process or a product thereof, at a current value of a processing parameter; determining whether a termination criterion is met by the value of the characteristic; if the termination criterion is not met, determining a new value of the processing parameter from the current value of the processing parameter and a prior value of the processing parameter, and setting the current value to the new value and repeating the determining steps; and if the termination criterion is met, providing the current value of the processing parameter as an approximation of a value of the processing parameter at which the characteristic has a target value.