公开(公告)号：US20180321603A1

公开(公告)日：2018-11-08

申请号：US15771634

申请日：2016-10-25

Applicant: ASML NETHERLAND B.V.

Inventor： Sicco OOSTERHOFF ,  Paul JANSSEN ,  Beltrijs Louise Marie-Joseph Katrie VERBRUGGE

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/24

CPC classification number: G03F7/70983 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/62 ,  G03F1/64 ,  G03F7/70916 ,  G03F7/70958 ,  G21K2201/067

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate includes an inner region and a border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane formed from at least the membrane layer; and a support holding the membrane, the support formed at least partially from the border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.