公开(公告)号：US20180239240A1

公开(公告)日：2018-08-23

申请号：US15752302

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Eric Willem Felix CASIMIRI ,  Tamara DRUZHININA ,  JANSSEN Paul ,  Michael Alfred Josephus KUIJKEN ,  Martinus Hendrikus Antonius LEENDERS ,  Sicco OOSTERHOFF ,  Mária PÉTER ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Beatrijs Louise Marie-Joseph Katrie VERBRUGGE ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN

IPC: G03F1/62 ,  G03F7/20

CPC classification number: G03F1/62 ,  G03F7/70983

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.