公开(公告)号：US20160282723A1

公开(公告)日：2016-09-29

申请号：US15033580

申请日：2014-11-04

申请人： ASML NETHERLANDS B.V.

发明人： Sander Catharina Reinier DERKS ,  Eric Willem Felix CASIMIRI ,  Marcel Mathijs Theodore DIERICHS ,  Sumant Sukdew Ramanujan OEMRAWSINGH ,  Wilhelmus Theodorus Anthonius VAN DEN EINDEN ,  Johannes Fransiscus Maria VELTHUIS ,  Alexander Nikolov ZDRAVKOV ,  Wassim ZEIN EDDINE

IPC分类号： G03F7/20

CPC分类号： G03F7/70033 ,  G02B5/003 ,  G02B5/208 ,  G02B5/22 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70633 ,  G03F7/70875 ,  G03F7/70883 ,  G03F7/70933 ,  H01J5/18 ,  H05G2/001

摘要： An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.

摘要翻译： 一种包括至少一个包括中空部分（41）的密封孔（40）的装置，具有内表面（42），所述内表面在所述装置的不同区域（50; 60）之间的界面处延伸; 以及定位在中空部分中的构件（43），其构造成基本上透射EUV辐射并且基本上过滤所述界面处的非EUV辐射; 其中所述中空部分的内表面具有被配置为增加由所述构件传递到所述中空部分的非EUV辐射的吸收的表面处理。

公开(公告)号：US20180239240A1

公开(公告)日：2018-08-23

申请号：US15752302

申请日：2016-08-26

申请人： ASML NETHERLANDS B.V.

发明人： Zomer Silvester HOUWELING ,  Eric Willem Felix CASIMIRI ,  Tamara DRUZHININA ,  JANSSEN Paul ,  Michael Alfred Josephus KUIJKEN ,  Martinus Hendrikus Antonius LEENDERS ,  Sicco OOSTERHOFF ,  Mária PÉTER ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Beatrijs Louise Marie-Joseph Katrie VERBRUGGE ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN

IPC分类号： G03F1/62 ,  G03F7/20

CPC分类号： G03F1/62 ,  G03F7/70983

摘要： A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.