公开(公告)号：US09619607B2

公开(公告)日：2017-04-11

申请号：US14462187

申请日：2014-08-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Jun Tao ,  Been-Der Chen ,  Yen-Wen Lu ,  Jiangwei Li ,  Min-Chun Tsai ,  Dong Mao

IPC: G06F17/50 ,  G03F1/70 ,  G03F7/20

CPC classification number: G06F17/5081 ,  G03F1/70 ,  G03F7/70441

Abstract: Described herein is a method for obtaining a preferred layout for a lithographic process, the method comprising: identifying an initial layout including a plurality of features; and reconfiguring the features until a termination condition is satisfied, thereby obtaining the preferred layout; wherein the reconfiguring comprises evaluating a cost function that measures how a lithographic metric is affected by a set of changes to the features for a plurality of lithographic process conditions, and expanding the cost function into a series of terms at least some of which are functions of characteristics of the features.