公开(公告)号：US09786044B2

公开(公告)日：2017-10-10

申请号：US14971887

申请日：2015-12-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Andreas Fuchs ,  Peter Hanzen Wardenier ,  Amandev Singh ,  Maxime D'Alfonso ,  Hilko Dirk Bos

IPC: G06K9/00 ,  G06T7/00 ,  G03F7/20 ,  G06T7/11

CPC classification number: G06T7/0004 ,  G03F7/70633 ,  G03F7/70941 ,  G06T7/11 ,  G06T2207/30148

Abstract: A scatterometer is used in a dark-field imaging mode to measure asymmetry-related parameters such as overlay. Measurements of small grating targets are made using identical optical paths, with the target in two orientations to obtain separate measurements of +1 and −1 diffraction orders. In this way, intensity scaling differences (tool asymmetry) are avoided. However, additive intensity defects due to stray radiation (ghosts) in the optical system cannot be avoided. Additive intensity issues strongly depend on the ratio between 0th and 1st order diffraction and are therefore strongly substrate (process) dependent. Calibration measurements are made on a few representative target gratings having biases. The calibration measurements are made, using not only different substrate rotations but also complementary apertures. Corrections are calculated and applied to correct asymmetry, to reduce error caused by stray radiation.