公开(公告)号：US20180275521A1

公开(公告)日：2018-09-27

申请号：US15763387

申请日：2016-10-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas I. WALLOW ,  Peng-cheng YANG ,  Adam LYONS ,  Mir Farrokh SHAYEGAN SALEK ,  Hermanus Adrianus DILLEN

IPC: G03F7/20 ,  G03F1/36 ,  G06F17/50

Abstract: A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plurality of gauge patterns, averaging together image information of each unit cell to arrive at a synthesized representation of the gauge pattern, and determining a geometric dimension of the gauge pattern based on the synthesized representation.