Enhanced lithographic displacement measurement system
    1.
    发明申请
    Enhanced lithographic displacement measurement system 失效
    增强光刻位移测量系统

    公开(公告)号:US20040169837A1

    公开(公告)日:2004-09-02

    申请号:US10719067

    申请日:2003-11-24

    Abstract: Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature, and turbulence using measurements from a second harmonic interferometer (SHI). A ramp, representing the dependence of the SHI data on path length, is removed before utilizing the SHI data. The SHI may include a passive Q-switched laser as a light source and Brewster prisms in the receiver module. Optical fibers may be used to conduct light to the detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.

    Abstract translation: 使用来自二次谐波干涉仪(SHI)的测量,对诸如压力,温度和湍流的大气条件的变化校正干涉测量系统的测量。 在使用SHI数据之前,除去表示SHI数据对路径长度的依赖性的斜坡。 SHI可以包括作为光源的无源Q开关激光器和接收器模块中的布鲁斯特棱镜。 光纤可以用于向检测器传导光。 反映测量光束的反射镜具有选择的厚度的涂层,以使SHI数据对涂层厚度变化的敏感性最小化。

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