公开(公告)号：US12276919B2

公开(公告)日：2025-04-15

申请号：US17635290

申请日：2020-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Marc Hauptmann ,  Cornelis Johannes Henricus Lambregts ,  Amir Bin Ismail ,  Rizvi Rahman ,  Allwyn Boustheen ,  Raheleh Pishkari ,  Everhardus Cornelis Mos ,  Ekaterina Mikhailovna Viatkina ,  Roy Werkman ,  Ralph Brinkhof

IPC: G03F7/00

Abstract: A method of controlling a semiconductor manufacturing process, the method including: obtaining first metrology data based on measurements performed after a first process step; obtaining second metrology data based on measurements performed after the first process step and at least one additional process step; estimating a contribution to the process of: a) a control action which is at least partially based on the second metrology data and/or b) the at least one additional process step by using at least partially the second metrology data; and determining a Key Performance Indicator (KPI) or a correction for the first process step using the first metrology data and the estimated contribution.