公开(公告)号：US20240302164A1

公开(公告)日：2024-09-12

申请号：US18580062

申请日：2022-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Tzu-Yi YANG ,  Richard Carl ZIMMERMAN ,  Adel JOOBEUR ,  Yevgeniy Konstantinovich SHMAREV

IPC: G01B11/27 ,  G03F7/00

CPC classification number: G01B11/272 ,  G03F7/70633 ,  G03F7/706849 ,  G03F7/706851

Abstract: An optical element, and a metrology tool or system employing the optical element for measurements of structures on a substrate. The optical element includes a first portion configured to reflect the light received from an illumination source towards the substrate, and a second portion configured to transmit the light redirected from the substrate or a desired location, the first portion having a higher coefficient of reflectivity than the second portion, and the second portion having a higher coefficient of transmissivity than the first portion. A metrology tool may include the optical elements and a sensor configured to receive a diffraction pattern caused by radiation redirected from a substrate, and a processor configured to receive a signal relating to the diffraction pattern from the sensor, and determine overlay associated with the substrate by analyzing the signal.

公开(公告)号：US20230359127A1

公开(公告)日：2023-11-09

申请号：US18026115

申请日：2021-08-24

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Hans BUTLER ,  Arie Jeffrey DEN BOEF ,  Mark Constant Johannes BAGGEN ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Richard Carl ZIMMERMAN

IPC: G03F7/00

CPC classification number: G03F7/70625 ,  G03F7/706835

Abstract: A metrology tool that includes a substrate table to hold a substrate; a projection system configured to project a beam on a target portion of the substrate; an actuator configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.

公开(公告)号：US20250068090A1

公开(公告)日：2025-02-27

申请号：US18725067

申请日：2023-01-02

Applicant: ASML NETHERLANDS B.V. ,  UNIVERSITY OF ROCHESTER

Inventor： Adel JOOBEUR ,  Richard JACOBS ,  Richard Carl ZIMMERMAN ,  Ali BASIRI ,  Thomas Gordon BROWN ,  Ashan Ariyawansa GALABADA DEWAGE

IPC: G03F9/00 ,  G03F7/00

Abstract: A fast and dynamic waveplate is described. The present systems and methods utilize stress birefringence that generates inside a plate when force is applied on one or more sides of the plate. The force is applied using one or more actuators distributed along the side(s) of the plate. The magnitude of the force can be controlled using a control unit. A generated stress birefringence is spatially varying across the plate. By carefully adjusting the force, the plate can be converted into a waveplate with an arbitrary value of retardance that is determined by the force. Since the parameter that determines the birefringence is force, a control unit can be used to apply different combinations of force values at a sub-millisecond speed to achieve fast control of the value of the birefringence as well as an orientation in the plate.