公开(公告)号：US20240302164A1

公开(公告)日：2024-09-12

申请号：US18580062

申请日：2022-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Tzu-Yi YANG ,  Richard Carl ZIMMERMAN ,  Adel JOOBEUR ,  Yevgeniy Konstantinovich SHMAREV

IPC: G01B11/27 ,  G03F7/00

CPC classification number: G01B11/272 ,  G03F7/70633 ,  G03F7/706849 ,  G03F7/706851

Abstract: An optical element, and a metrology tool or system employing the optical element for measurements of structures on a substrate. The optical element includes a first portion configured to reflect the light received from an illumination source towards the substrate, and a second portion configured to transmit the light redirected from the substrate or a desired location, the first portion having a higher coefficient of reflectivity than the second portion, and the second portion having a higher coefficient of transmissivity than the first portion. A metrology tool may include the optical elements and a sensor configured to receive a diffraction pattern caused by radiation redirected from a substrate, and a processor configured to receive a signal relating to the diffraction pattern from the sensor, and determine overlay associated with the substrate by analyzing the signal.