公开(公告)号：US11199771B2

公开(公告)日：2021-12-14

申请号：US16339402

申请日：2017-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Stef Marten Johan Janssens ,  Koen Cuypers ,  Rogier Hendrikus Magdalena Cortie ,  Sudhir Srivastava ,  Theodorus Johannes Antonius Renckens ,  Jeroen Gerard Gosen ,  Erik Henricus Egidius Catharina Eummelen ,  Hendrikus Johannes Schellens ,  Adrianus Marinus Wouter Heeren ,  Bo Lenssen

IPC: G03F7/00 ,  F16K31/00 ,  F16K37/00 ,  H01L21/67

Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.

公开(公告)号：US10948825B2

公开(公告)日：2021-03-16

申请号：US16061553

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Christianus Wilhelmus Johannes Berendsen ,  Güneş Nakibo{hacek over (g)}lu ,  Daan Daniel Johannes Antonius Van Sommeren ,  Gijsbert Rispens ,  Johan Franciscus Maria Beckers ,  Theodorus Johannes Antonius Renckens

IPC: G03F7/16 ,  G03F7/20

Abstract: A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.