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公开(公告)号：US11822252B2
公开(公告)日：2023-11-21
申请号：US17155951
申请日：2021-01-22
发明人： Dzmitry Labetski , Christianus Wilhelmus Johannes Berendsen , Rui Miguel Duarte Rodreigues Nunes , Alexander Igorevich Ershov , Kornelis Frits Feenstra , Igor Vladimirovich Fomenkov , Klaus Martin Hummler , Arun Johnkadaksham , Matthias Kraushaar , Andrew David Laforge , Marc Guy Langlois , Maksim Loginov , Yue Ma , Seyedmohammad Mojab , Kerim Nadir , Alexander Shatalov , John Tom Stewart , Henricus Gerardus Tegenbosch , Chunguang Xia
CPC分类号： G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/008
摘要： An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
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公开(公告)号：US11720032B2
公开(公告)日：2023-08-08
申请号：US17273758
申请日：2019-08-30
发明人： Raphael Nico Johan Stegen , Erik Henricus Egidius Catharina Eummelen , Christianus Wilhelmus Johannes Berendsen , Theodorus Wilhelmus Polet , Giovanni Luca Gattobigio
CPC分类号： G03F7/7065 , G01N21/88 , G03F7/70341 , G03F7/70716 , G01N2201/0636 , G01N2201/103
摘要： A process tool for processing production substrates, the process tool including: a movable stage configured to perform long-stroke movements in an X-Y plane; an imaging device mounted to a fixed part of the tool and having an optical axis substantially parallel to the X-Y plane; and a mirror mounted on the movable stage and oriented at a predetermined angle of inclination to the X-Y plane so that by moving the movable stage to a predetermined position a part of a component to be inspected can be imaged by the imaging device.
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公开(公告)号：US10018926B2
公开(公告)日：2018-07-10
申请号：US15314841
申请日：2015-05-07
发明人： Rogier Hendrikus Magdalena Cortie , Christianus Wilhelmus Johannes Berendsen , Andre Bernardus Jeunink , Adrianus Hendrik Koevoets , Jim Vincent Overkamp , Siegfried Alexander Tromp , Van Vuong Vy , Daniel Elza Roeland Audenaerdt
CPC分类号： G03F7/7095 , G03F7/70341 , G03F7/70733 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.
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公开(公告)号：US09939738B2
公开(公告)日：2018-04-10
申请号：US15329536
申请日：2015-07-16
发明人： Adrianus Hendrik Koevoets , Christianus Wilhelmus Johannes Berendsen , Rogier Hendrikus Magdalena Cortie , Jim Vincent Overkamp , Patricius Jacobus Neefs , Putra Saputra , Ruud Hendrikus Martinus Johannes Bloks , Michael Johannes Hendrika Wilhelmina Renders , Johan Gertrudis Cornelis Kunnen , Thibault Simon Mathieu Laurent
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/70783 , G03F7/70875
摘要： A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two-phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.
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公开(公告)号：USRE49142E1
公开(公告)日：2022-07-19
申请号：US16590895
申请日：2019-10-02
发明人： Adrianus Hendrik Koevoets , Christianus Wilhelmus Johannes Berendsen , Rogier Hendrikus Magdalena Cortie , Jim Vincent Overkamp , Patricius Jacobus Neefs , Putra Saputra , Ruud Hendrikus Martinus Johannes Bloks , Michael Johannes Hendrika Wilhelmina Renders , Johan Gertrudis Cornelis Kunnen , Thibault Simon Mathieu Laurent
IPC分类号： G03F7/20
摘要： A lithographic apparatus comprising includes an object table which carries an object. The lithographic apparatus may further comprise at least one include a sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the a deformation of the an object due to a varying loads load during operation of the lithographic apparatus, for example a varying loads load induced by a two-phase flow in a channel formed within of the object table. Additionally, or alternatively, the The lithographic apparatus comprises may include a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to provide a pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.
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公开(公告)号：US10955749B2
公开(公告)日：2021-03-23
申请号：US16469689
申请日：2018-01-05
发明人： Dzmitry Labetski , Christianus Wilhelmus Johannes Berendsen , Rui Miguel Duarte Rodriges Nunes , Alexander Igorevich Ershov , Kornelis Frits Feenstra , Igor Vladimirovich Fomenkov , Klaus Martin Hummler , Arun Johnkadaksham , Matthias Kraushaar , Andrew David Laforge , Marc Guy Langlois , Maksim Loginov , Yue Ma , Seyedmohammad Mojab , Kerim Nadir , Alexander Shatalov , John Tom Stewart, IV , Henricus Gerardus Tegenbosch , Chunguang Xia
摘要： An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
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公开(公告)号：US10948825B2
公开(公告)日：2021-03-16
申请号：US16061553
申请日：2016-12-22
发明人： Christianus Wilhelmus Johannes Berendsen , Güneş Nakibo{hacek over (g)}lu , Daan Daniel Johannes Antonius Van Sommeren , Gijsbert Rispens , Johan Franciscus Maria Beckers , Theodorus Johannes Antonius Renckens
摘要： A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.
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公开(公告)号：US10216095B2
公开(公告)日：2019-02-26
申请号：US14911452
申请日：2014-07-22
发明人： Michel Riepen , Christianus Wilhelmus Johannes Berendsen , Anton Alexander Darhuber , Hubertus Mattheus Joseph Maria Wedershoven , Josephus Catharina Henricus Zeegers
摘要： An immersion lithographic apparatus is configured to subject a photosensitive layer on a substrate to a patterned beam of radiation via a liquid. The immersion lithographic apparatus includes a moveable object having a surface, a fluid handling system to control a presence of the liquid in a volume restricted by the surface, the fluid handling system, and a free surface of the liquid, the free surface extending between the surface and the fluid handling system; and a heating system configured to locally heat a portion of the liquid at a receding side of a periphery edge of the volume in contact with the surface, where the object is receding from the volume along a direction of movement of the object relative to the fluid handling system.
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公开(公告)号：US09983489B2
公开(公告)日：2018-05-29
申请号：US15311548
申请日：2015-04-24
发明人： Christianus Wilhelmus Johannes Berendsen , Marcel Beckers , Henricus Jozef Castelijns , Hubertus Antonius Geraets , Adrianus Hendrik Koevoets , Leon Martin Levasier , Peter Schaap , Bob Streefkerk , Siegfried Alexander Tromp
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70033 , G03F7/70625 , G03F7/70783 , G03F7/70875 , G03F7/70891 , G03F7/70941
摘要： A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
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