公开(公告)号：US20170160650A1

公开(公告)日：2017-06-08

申请号：US15419769

申请日：2017-01-30

申请人： ASML NETHERLANDS B.V.

发明人： Erik Roelof LOOPSTRA ,  Johannes Jacobus Matheus BASELMANS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Johannes Christiaan Maria JASPER ,  Matthew LIPSON ,  Hendricus Johannes Maria MEIJER ,  Uwe MICKAN ,  Johannes Catharinus Hubertus MULKENS ,  Tammo UITTERDIJK

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.