公开(公告)号：US20180321602A1

公开(公告)日：2018-11-08

申请号：US15764594

申请日：2016-10-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Adrianus Hendrik KOEVOETS ,  Michael Leo NELSON ,  Jacobus Cornelis Gerardus VAN DER SANDEN ,  Geoffrey O'CONNOR ,  Michael Andrew CHIEDA ,  Tammo UITTERDIJK

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70875 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/67248 ,  H01L21/6831

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.

公开(公告)号：US20240176254A1

公开(公告)日：2024-05-30

申请号：US18281921

申请日：2022-03-17

Applicant: ASML Netherlands B.V.

Inventor： Keane Michael LEVY ,  Sotrios LYRINTZIS ,  Maham AFTAB ,  Seyed Mehdi SHEIKHOLESLAM-NOURI ,  Tammo UITTERDIJK

IPC: G03F7/00 ,  H01L21/683

CPC classification number: G03F7/70708 ,  G03F7/70783 ,  H01L21/6833

Abstract: Systems, apparatuses, and methods are provided for manufacturing an electrostatic clamp. An example method can include forming a dielectric layer that includes a plurality of burls for supporting an object. The example method can further include forming an electrostatic layer that includes one or more electrodes. The example method can further include generating, using the electrostatic layer, an electrostatic force to electrostatically clamp the object to the plurality of burls in response to an application of one or more voltages to the one or more electrodes. In some aspects, a first magnitude of the electrostatic force in a first region of the dielectric layer can be different than a second magnitude of the electrostatic force in a second region of the dielectric layer. For example, the first magnitude and the second magnitude can be part of a linear, non-linear, or stepped (e.g., multi-level) electrostatic force gradient.

公开(公告)号：US20230384694A1

公开(公告)日：2023-11-30

申请号：US18269387

申请日：2021-12-02

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Abdullah ALIKHAN ,  Tammo UITTERDIJK ,  Johannes Bernardus Charles ENGELEN ,  Daniel KAMIENIECKI ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Thomas POIESZ ,  Leon Martin LEVASIER ,  Jim Vincent OVERKAMP ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Koos VAN BERKEL ,  Gregory James DIGUIDO ,  Anthony C. SOCCI, JR. ,  Iliya SIGAL ,  Bram Antonius Gerardus LOMANS ,  Michel Ben Isel HABETS

IPC: G03F7/00 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70708 ,  G03F7/7095 ,  G03F7/70783 ,  H01L21/6838 ,  H01L21/68757

Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.

公开(公告)号：US20230236518A1

公开(公告)日：2023-07-27

申请号：US18008283

申请日：2021-06-09

Applicant: ASML Netherlands B.V. ,  ASML HOLDING N.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Koos VAN BERKEL ,  Marcus Adrianus VAN DE KERKHOF ,  Roger Franciscus Mattheus Maria HAMELINCK ,  Shahab SHERVIN ,  Marinus Augustinus Christiaan VERSCHUREN ,  Johannes Bernardus Charles ENGELEN ,  Matthias KRUIZINGA ,  Tammo UITTERDIJK ,  Oleksiy Sergiyovich GALAKTIONOV ,  Kjeld Gertrudus Hendrikus JANSSEN ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Peter VAN DELFT

IPC: G03F7/00

CPC classification number: G03F7/70825 ,  G03F7/70708

Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

公开(公告)号：US20170160650A1

公开(公告)日：2017-06-08

申请号：US15419769

申请日：2017-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Roelof LOOPSTRA ,  Johannes Jacobus Matheus BASELMANS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Johannes Christiaan Maria JASPER ,  Matthew LIPSON ,  Hendricus Johannes Maria MEIJER ,  Uwe MICKAN ,  Johannes Catharinus Hubertus MULKENS ,  Tammo UITTERDIJK

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

公开(公告)号：US20130176547A1

公开(公告)日：2013-07-11

申请号：US13786400

申请日：2013-03-05

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Wilhelmus Petrus DE BOEIJ ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Michel Fransois Hubert KLAASSEN ,  Martijn Gerard Dominique WEHRENS ,  Haico Victor KOK ,  Wilhelmus Jacobus Maria Rooijakkers ,  Tammo UITTERDIJK

IPC: G03F7/20

CPC classification number: G03F7/70133 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

Abstract: A lithographic apparatus includes an illumination system, a support, a patterning device, a substrate table, a projection system, and a detector. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable and a polarization analyzer, such as a linear polarizer. The polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate.

Abstract translation: 光刻设备包括照明系统，支撑件，图案形成装置，衬底台，投影系统和检测器。 该装置还包括可调节的诸如四分之一波片的偏振改变元件和诸如线性偏振器的偏振分析器。 偏振改变元件和偏振分析器在辐射束路径中依次布置在图案形成装置将被支撑件保持的水平处。 通过对偏振变化元件的不同旋转取向进行强度测量，可以获得关于图案形成装置的电平处的辐射的偏振状态的信息。 由于偏振分析仪位于投影系统之前，测量不受检测器位于投影系统之后（例如在基板的水平面）的事实的影响。

公开(公告)号：US20240248415A1

公开(公告)日：2024-07-25

申请号：US18562770

申请日：2022-04-28

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Shahab SHERVIN ,  Tammo UITTERDIJK ,  Matthew LIPSON ,  Marcus Martinus Petrus Adrianus VERMEULEN

IPC: G03F7/00 ,  H01L21/687

CPC classification number: G03F7/707 ,  G03F7/7095 ,  G03F7/70975 ,  H01L21/6875

Abstract: The present disclosure is directed to a modular wafer table and methods for refurbishing a scrapped wafer to manufacture the modular wafer table. The method comprises removing one or more burls from a surface of a wafer table; polishing the surface of the wafer table after removing the one or more burls to form a core module; forming a burl module having a plurality of burls thereon; and bonding the core module to the burl module.

公开(公告)号：US20220082953A1

公开(公告)日：2022-03-17

申请号：US17612679

申请日：2020-05-05

Applicant: ASML HOLDING N.V ,  ASML NETHERLANDS B.V.

Inventor： Matthew LIPSON ,  Satish ACHANTA ,  Benjamin David DAWSON ,  Matthew Anthony SORNA ,  IIiya SIGAL ,  Tammo UITTERDIJK

IPC: G03F7/20

Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

公开(公告)号：US20150370180A1

公开(公告)日：2015-12-24

申请号：US14762452

申请日：2014-02-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Santiago E. DEL PUERTO ,  Matthew LIPSON ,  Kenneth C. HENDERSON ,  Raymond Wilhelmus Louis LAFARRE ,  Louis John MARKOYA ,  Tammo UITTERDIJK ,  Johannes VERMEULEN ,  Antonius Franciscus Johannes DE GROOT ,  Ronald VAN DER WILK

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

Abstract translation: 诸如夹具（310）的支撑件构造成可释放地保持图案形成装置例如掩模版（300）以固定它并防止其热引起的变形。 例如，静电夹具包括具有相对的第一（313）和第二（315）表面的第一基底（312），位于第一表面上并被构造成接触光罩的多个毛刺（316），第二基底 ）具有相对的第一（317）和第二（319）表面。 第二衬底的第一表面耦合到第一衬底的第二表面。 多个冷却元件（318）位于第二基板的第一表面和第一基板的第二表面之间。 冷却元件构造成使电子从第一衬底的第二表面行进到第二衬底的第一表面。 每个冷却元件基本上与相应的毛刺对齐。