公开(公告)号：US11119414B2

公开(公告)日：2021-09-14

申请号：US16851477

申请日：2020-04-17

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson Middlebrooks ,  Willem Maria Julia Marcel Coene ,  Frank Arnoldus Johannes Maria Driessen ,  Adrianus Cornelis Matheus Koopman ,  Markus Gerardus Martinus Maria Van Kraaij

IPC: G06F15/18 ,  G03F7/20 ,  G06N20/00 ,  G06F30/367 ,  G06N7/00

Abstract: A defect prediction method for a device manufacturing process involving production substrates processed by a lithographic apparatus, the method including training a classification model using a training set including measured or determined values of a process parameter associated with the production substrates processed by the device manufacturing process and an indication regarding existence of defects associated with the production substrates processed in the device manufacturing process under the values of the process parameter, and producing an output from the classification model that indicates a prediction of a defect for a substrate.

公开(公告)号：US20210405545A1

公开(公告)日：2021-12-30

申请号：US17471363

申请日：2021-09-10

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson Middlebrooks ,  Willem Maria Julia Marcel Coene ,  Frank Arnoldus Johannes Maria Driessen ,  Adrianus Cornelis Matheus Koopman ,  Markus Gerardus Martinus Maria Van Kraaij

IPC: G03F7/20 ,  G06N20/00 ,  G06F30/367 ,  G06N7/00

Abstract: A defect prediction method for a device manufacturing process involving production substrates processed by a lithographic apparatus, the method including training a classification model using a training set including measured or determined values of a process parameter associated with the production substrates processed by the device manufacturing process and an indication regarding existence of defects associated with the production substrates processed in the device manufacturing process under the values of the process parameter, and producing an output from the classification model that indicates a prediction of a defect for a substrate.

公开(公告)号：US11243470B2

公开(公告)日：2022-02-08

申请号：US16331547

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish Kumar ,  Adrianus Johannes Hendrikus Schellekens ,  Sietse Thijmen Van Der Post ,  Ferry Zijp ,  Willem Maria Julia Marcel Coene ,  Peter Danny Van Voorst ,  Duygu Akbulut ,  Sarathi Roy

IPC: G03F7/20

Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.