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公开(公告)号：US12164125B2
公开(公告)日：2024-12-10
申请号：US17600420
申请日：2020-03-06
Applicant: ASML Netherlands B.V.
Inventor： Han-Kwang Nienhuys , Sietse Thijmen Van Der Post
IPC: G02B5/18
Abstract: A grating is provided on a mirror for specularly reflecting and diffracting a grazing-incidence beam of radiation and has a periodic structure with a grating period comprising first (ridge) and second (trench) substructures either side of a sidewall 806 facing the incident beam 800. The ridge is configured to specularly reflect the beam from the flat top 808 of the ridge into a specularly reflected beam 810 in a zeroth-order direction β′=β. The grating is configured with fixed or varying pitch to diffract the beam from the grating periods in one or more non-zero-diffraction-order direction β′≠β. The shape of the trench may be is described by structural parameters top width and depth that define the aspect ratio of the trench. The shape is determined such that any rays (and optionally diffraction) of the beam that reflect once from the trench floor in the zeroth-order direction are obscured by the sidewall.
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公开(公告)号：US11815402B2
公开(公告)日：2023-11-14
申请号：US17425646
申请日：2019-12-19
Applicant: ASML Netherlands B.V.
Inventor： Sietse Thijmen Van Der Post , Peter Danny Van Voorst
CPC classification number: G01J9/00 , G01N23/207 , G02B3/0037 , G02B5/1819 , G02B5/1838 , G03F7/70616 , G21K1/065 , G01J2009/002
Abstract: Disclosed is a wavefront sensor for measuring a tilt of a wavefront at an array of locations across a beam of radiation, wherein said wavefront sensor comprises a film, for example of Zirconium, having an indent array comprising an indent at each of said array of locations, such that each indent of the indent array is operable to perform focusing of said radiation. Also disclosed is a radiation source and inspection apparatus comprising such a wavefront sensor.
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3.发明申请公开(公告)号：US20190003981A1
公开(公告)日：2019-01-03
申请号：US16102178
申请日：2018-08-13
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny Van Voorst , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Sietse Thijmen Van Der Post
IPC: G01N21/88 , G03F7/20 , G01N21/95 , G01N21/956 , H05G2/00
CPC classification number: G01N21/8806 , G01N21/9501 , G01N2021/95676 , G03F7/70616 , G03F7/7065 , H05G2/00 , H05G2/008
Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.
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4.发明申请公开(公告)号：US20180073992A1
公开(公告)日：2018-03-15
申请号：US15683216
申请日：2017-08-22
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny VAN VOORST , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Sietse Thijmen Van Der Post
CPC classification number: G01N21/8806 , G01N21/9501 , G01N2021/95676 , G03F7/70616 , G03F7/7065 , H05G2/00 , H05G2/008
Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.
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公开(公告)号：US10126659B2
公开(公告)日：2018-11-13
申请号：US15286319
申请日：2016-10-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Ferry Zijp , Sietse Thijmen Van Der Post , Fanhe Kong , Duygu Akbulut
IPC: G03B27/68 , G03F7/20 , G02B21/24 , G01N21/956
Abstract: A method including obtaining a plurality of radiation distributions of measurement radiation redirected by the target, each of the plurality of radiation distributions obtained at a different gap distance between the target and an optical element of a measurement apparatus, the optical element being the nearest optical element to the target used to provide the measurement radiation to the target, and determining a parameter related to the target using data of the plurality of radiation distributions in conjunction with a mathematical model describing the measurement target.
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Patent Agency Ranking
公开(公告)号：US09851246B2
公开(公告)日：2017-12-26
申请号：US15053968
申请日：2016-02-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Sietse Thijmen Van Der Post
IPC: G01B11/04 , G03B27/32 , G03B27/74 , G11B11/00 , G01J1/44 , G01B11/02 , G03F7/20 , G02B21/00 , G01N21/956
CPC classification number: G01J1/44 , G01B11/02 , G01J2001/444 , G01N21/956 , G02B21/0016 , G03F7/70325 , G03F7/70483 , G03F7/70516 , G03F7/70625 , G03F7/70633
Abstract: A method and apparatus for optical metrology is disclosed. There is disclosed, for example, a method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including calculating a correction factor for the variation of radiation intensity of the radiation intensity distribution as a function of variation of the distance of the gap.
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公开(公告)号：US12269229B2
公开(公告)日：2025-04-08
申请号：US17433774
申请日：2020-01-28
Applicant: ASML Netherlands B.V.
Inventor： Sander Bas Roobol , Sietse Thijmen Van Der Post
Abstract: Disclosed is a method of manufacturing a reflector. The method comprises polishing (520) at least the uppermost surface of the uppermost substantially flat substrate of a plurality of substantially flat substrates, deforming (530) each substantially flat substrate into the desired shape, and bonding (540) the deformed substrates together to form said reflector. In an embodiment, the deforming and bonding is performed together using a mold.
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公开(公告)号：US11626704B2
公开(公告)日：2023-04-11
申请号：US15902454
申请日：2018-02-22
Applicant: ASML Netherlands B.V.
Inventor： Sietse Thijmen Van Der Post , Sander Bas Roobol , Pavel Evtushenko
IPC: H01S3/0959 , H01S3/00 , G03F7/20 , H01S3/109 , H01J47/02 , H01S3/0971 , H01L21/263 , H05G2/00
Abstract: A radiation source arrangement causes interaction between pump radiation (340) and a gaseous medium (406) to generate EUV or soft x-ray radiation by higher harmonic generation (HHG). The operating condition of the radiation source arrangement is monitored by detecting (420/430) third radiation (422) resulting from an interaction between condition sensing radiation and the medium. The condition sensing radiation (740) may be the same as the first radiation or it may be separately applied. The third radiation may be for example a portion of the condition sensing radiation that is reflected or scattered by a vacuum-gas boundary, or it may be lower harmonics of the HHG process, or fluorescence, or scattered. The sensor may include one or more image detectors so that spatial distribution of intensity and/or the angular distribution of the third radiation may be analyzed. Feedback control based on the determined operating condition stabilizes operation of the HHG source.
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公开(公告)号：US10578979B2
公开(公告)日：2020-03-03
申请号：US16279001
申请日：2019-02-19
Applicant: ASML Netherlands B.V.
Inventor： Sietse Thijmen Van Der Post , Ferry Zijp , Sander Bas Roobol
Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.
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10.发明授权公开(公告)号：US10330606B2
公开(公告)日：2019-06-25
申请号：US15683216
申请日：2017-08-22
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny Van Voorst , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Sietse Thijmen Van Der Post
IPC: G01N21/88 , G03F7/20 , G01N21/95 , H05G2/00 , G01N21/956
Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.
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