公开(公告)号：US12072181B2

公开(公告)日：2024-08-27

申请号：US17487896

申请日：2021-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan Wang ,  Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: G01B15/08 ,  H01J37/20 ,  H01J37/21 ,  H01J37/22 ,  H01J37/28

CPC classification number: G01B15/08 ,  H01J37/20 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/20235 ,  H01J2237/2814

Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.