公开(公告)号：US20240103386A1

公开(公告)日：2024-03-28

申请号：US18376237

申请日：2023-10-03

Applicant: ASML NETHERLANDS B.V ,  ASML HOLDING N.V

Inventor： Derk Servatius Gertruda BROUNS ,  Joshua ADAMS ,  Aage BENDIKSEN ,  Richard JACOBS ,  Andrew JUDGE ,  Veera Venkata Narasimha Narendra Phani KOTTAPALLI ,  Joseph Harry LYONS ,  Theodorus Marinus MODDERMAN ,  Manish RANJAN ,  Marcus Adrianus VAN DE KERKHOF ,  Xugang XIONG

IPC: G03F7/00 ,  G03F1/62 ,  G03F1/64

CPC classification number: G03F7/7085 ,  G03F1/62 ,  G03F1/64 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70983

Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

公开(公告)号：US20200341366A1

公开(公告)日：2020-10-29

申请号：US16765339

申请日：2018-11-27

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V

Inventor： Derk Servatius Gertruda BROUNS ,  Joshua ADAMS ,  Aage BENDIKSEN ,  Richard JACOBS ,  Andrew JUDGE ,  Veera Venkata Narasimha Narendra Phani KOTTAPALLI ,  Joseph Harry LYONS ,  Theodorus Marinus MODDERMAN ,  Manish RANJAN ,  Marcus Adrianus VAN DE KERKHOF ,  Xugang XIONG

IPC: G03F1/64 ,  G03F1/00 ,  G03F7/20

Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

公开(公告)号：US20250068090A1

公开(公告)日：2025-02-27

申请号：US18725067

申请日：2023-01-02

Applicant: ASML NETHERLANDS B.V. ,  UNIVERSITY OF ROCHESTER

Inventor： Adel JOOBEUR ,  Richard JACOBS ,  Richard Carl ZIMMERMAN ,  Ali BASIRI ,  Thomas Gordon BROWN ,  Ashan Ariyawansa GALABADA DEWAGE

IPC: G03F9/00 ,  G03F7/00

Abstract: A fast and dynamic waveplate is described. The present systems and methods utilize stress birefringence that generates inside a plate when force is applied on one or more sides of the plate. The force is applied using one or more actuators distributed along the side(s) of the plate. The magnitude of the force can be controlled using a control unit. A generated stress birefringence is spatially varying across the plate. By carefully adjusting the force, the plate can be converted into a waveplate with an arbitrary value of retardance that is determined by the force. Since the parameter that determines the birefringence is force, a control unit can be used to apply different combinations of force values at a sub-millisecond speed to achieve fast control of the value of the birefringence as well as an orientation in the plate.