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    LITHOGRAPHIC APPARATUS
    4.
    发明申请
    LITHOGRAPHIC APPARATUS 有权
    LITHOGRAPHIC设备

    公开(公告)号：US20150192864A1

    公开(公告)日：2015-07-09

    申请号：US14661929

    申请日：2015-03-18

    申请人： ASML NETHERLANDS B.V.

    发明人： Theodorus Marinus MODDERMAN

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/7075

    摘要： A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.

    摘要翻译： 光刻设备包括：支撑基板的第一工作台; 第二表，不被配置为支撑基板，包括用于感测来自投影系统的图案化的辐射束的特性的传感器单元，所述第二台在第一台从下方移出时在投影系统下方移动 投影系统，在第一和第二表彼此独立地移动; 以及液体供应系统，用于向投影系统和基板，第一台和/或第二台之间的空间供应液体，其中第二台被配置为在液体限制结构的底部提供限制表面 当第一台从投影系统下方移除时，以防止液体泄漏到光刻设备的其余部分中。

    LITHOGRAPHIC APPARATUS
    5.
    发明申请
    LITHOGRAPHIC APPARATUS 审中-公开

    公开(公告)号：US20180059556A1

    公开(公告)日：2018-03-01

    申请号：US15802429

    申请日：2017-11-02

    申请人： ASML NETHERLANDS B.V.

    发明人： Theodorus Marinus MODDERMAN

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/7075

    摘要： A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.

    LITHOGRAPHIC APPARATUS
    6.
    发明申请
    LITHOGRAPHIC APPARATUS 有权
    LITHOGRAPHIC设备

    公开(公告)号：US20170010546A1

    公开(公告)日：2017-01-12

    申请号：US15216670

    申请日：2016-07-21

    申请人： ASML NETHERLANDS B.V.

    发明人： Theodorus Marinus MODDERMAN

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/7075

    摘要： A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.

    摘要翻译： 光刻设备包括：支撑基板的第一工作台; 第二表，不被配置为支撑基板，包括用于感测来自投影系统的图案化的辐射束的特性的传感器单元，所述第二台在第一台从下方移出时在投影系统下方移动 投影系统，在第一和第二表彼此独立地移动; 以及液体供应系统，用于向投影系统和基板，第一台和/或第二台之间的空间供应液体，其中第二台被配置为在液体限制结构的底部提供限制表面 当第一台从投影系统下方移除时，以防止液体泄漏到光刻设备的其余部分中。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    7.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20150331334A1

    公开(公告)日：2015-11-19

    申请号：US14807458

    申请日：2015-07-23

    申请人： ASML NETHERLANDS B.V.

    发明人： Joannes Theodoor DE SMIT ,  Vadim Yevgenyevich BANINE ,  Theodorus Hubertus Josephus BISSCHOPS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Theodorus Marinus MODDERMAN

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/708 ,  G03F7/70858

    摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

    摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。