PELLICLE FRAME FOR EUV LITHOGRAPHY
    7.
    发明公开

    公开(公告)号:US20230259019A1

    公开(公告)日:2023-08-17

    申请号:US17920392

    申请日:2021-03-25

    IPC分类号: G03F1/64 G03F1/22

    CPC分类号: G03F1/64 G03F1/22

    摘要: A pellicle frame includes: a first portion; and a plurality of second portions. The first portion is for connection to a border of a pellicle. The first portion includes a hollow and generally rectangular body. The plurality of second portions are for connection to a patterning device. The first portion and the plurality of second portions are all formed from a first material. Each of the second portions is connected to the first portion by a spring portion formed from the first material. Such a pellicle frame is advantageous since the first portion, the plurality of second portions and the spring portions are all formed from a same material.