公开(公告)号：US20140333915A1

公开(公告)日：2014-11-13

申请号：US14361145

申请日：2012-11-02

Applicant: ASML Netherlands B.V.

Inventor： Jan Frederik Hoogkamp ,  Bastiaan Stephanus Hendricus Jansen ,  Maurice Willem Jozef Etiënne Wijckmans

IPC: G03F7/20 ,  H01J37/32

CPC classification number: G03F7/70033 ,  G03F7/70141 ,  G03F7/70175 ,  G03F7/7085 ,  H01J37/32339 ,  H01J2237/04 ,  H01J2237/327 ,  H05G2/005 ,  H05G2/008

Abstract: A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of fuel droplets along a trajectory (140) towards a plasma formation location (212). The radiation source is configured to receive a first amount of radiation (205) such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location. The first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation (132). The radiation source further comprises an alignment detector having a first sensor arrangement (122) and a second sensor arrangement (134). The first sensor arrangement is configured to measure a property of a third amount of radiation (205a) that is indicative of a focus position of the first amount of radiation. The second sensor arrangement is configured to measure a property of a fourth amount of radiation (138), the fourth amount of radiation being a portion of the first amount of radiation that is reflected by the fuel droplet upon which the first amount of radiation is incident.

Abstract translation: 适合于向光刻设备的照明器提供辐射束的辐射源（SO）。 辐射源包括被配置为沿着轨迹（140）引导燃料液滴流朝向等离子体形成位置（212）的喷嘴（128）。 辐射源被配置为接收第一量的辐射（205），使得在使用中，第一量的辐射入射在等离子体形成位置处的燃料液滴上。 第一量的辐射将能量传递到燃料液滴以产生发射第二量的辐射的辐射产生等离子体（132）。 辐射源还包括具有第一传感器装置（122）和第二传感器装置（134）的对准检测器。 第一传感器装置被配置为测量指示第一辐射量的焦点位置的第三量的辐射（205a）的性质。 第二传感器装置被配置成测量第四量的辐射（138）的性质，第四辐射量是被第一辐射量入射的燃料液滴反射的第一辐射量的一部分 。

公开(公告)号：US09500953B2

公开(公告)日：2016-11-22

申请号：US14361145

申请日：2012-11-02

Applicant: ASML Netherlands B.V.

Inventor： Jan Frederik Hoogkamp ,  Bastiaan Stephanus Hendricus Jansen ,  Maurice Willem Jozef Etiënne Wijckmans

IPC: G03B27/54 ,  G03B27/72 ,  G03B27/74 ,  G03F7/20 ,  H01J37/32 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70141 ,  G03F7/70175 ,  G03F7/7085 ,  H01J37/32339 ,  H01J2237/04 ,  H01J2237/327 ,  H05G2/005 ,  H05G2/008

Abstract: A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of fuel droplets along a trajectory (140) towards a plasma formation location (212). The radiation source is configured to receive a first amount of radiation (205) such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location. The first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation (132). The radiation source further comprises an alignment detector having a first sensor arrangement (122) and a second sensor arrangement (134). The first sensor arrangement is configured to measure a property of a third amount of radiation (205a) that is indicative of a focus position of the first amount of radiation. The second sensor arrangement is configured to measure a property of a fourth amount of radiation (138), the fourth amount of radiation being a portion of the first amount of radiation that is reflected by the fuel droplet upon which the first amount of radiation is incident.

Abstract translation: 适合于向光刻设备的照明器提供辐射束的辐射源（SO）。 辐射源包括被配置为沿着轨迹（140）引导燃料液滴流朝向等离子体形成位置（212）的喷嘴（128）。 辐射源被配置为接收第一量的辐射（205），使得在使用中，第一量的辐射入射在等离子体形成位置处的燃料液滴上。 第一量的辐射将能量传递到燃料液滴以产生发射第二量的辐射的辐射产生等离子体（132）。 辐射源还包括具有第一传感器装置（122）和第二传感器装置（134）的对准检测器。 第一传感器装置被配置为测量指示第一辐射量的焦点位置的第三量的辐射（205a）的性质。 第二传感器装置被配置成测量第四量的辐射（138）的性质，第四辐射量是被第一辐射量入射的燃料液滴反射的第一辐射量的一部分 。