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公开(公告)号:US11690159B2
公开(公告)日:2023-06-27
申请号:US17284060
申请日:2019-10-25
Applicant: ASML Netherlands B.V.
Inventor: Bob Rollinger , Georgiy Olegovich Vaschenko , Chirag Rajyaguru , Alexander Igorevich Ershov , Joshua Mark Lukens , Mathew Cheeran Abraham
IPC: H05G2/00
CPC classification number: H05G2/006
Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.
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公开(公告)号:US20230164900A1
公开(公告)日:2023-05-25
申请号:US18011593
申请日:2021-06-21
Applicant: ASML Netherlands B.V.
Inventor: Alexander Igorevich Ershov , Chirag Rajyaguru , Dietmar Uwe Herbert Trees , Joshua Mark Lukens , Theodorus Wilhelmus Driessen , Robert Jay Rafac , Georgiy Olegovich Vaschenko
IPC: H05G2/00
CPC classification number: H05G2/006 , H05G2/008 , G03F7/70033
Abstract: Apparatus for and method of accelerating droplets used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting a nozzle in a stream that breaks up into droplets that then undergo coalescence. The droplets are then subjected to a stream of gas that entrains and accelerates the droplets.
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公开(公告)号:US11448967B2
公开(公告)日:2022-09-20
申请号:US17273978
申请日:2019-09-20
Applicant: ASML Netherlands B.V.
Inventor: Georgiy Olegovich Vaschenko
Abstract: A system for an extreme ultraviolet light source includes a capillary tube, the capillary tube including a sidewall extending from a first end to a second end, the sidewall including an exterior wall and an interior wall, the interior wall defining a passage that extends from the first end to the second end; an actuator configured to be positioned at the exterior wall of the capillary tube; and an adhesive between the exterior wall and the actuator, the adhesive being configured to mechanically couple the actuator and the capillary tube, wherein the adhesive occupies a volume that remains substantially the same or expands as a result of curing.
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公开(公告)号:US20220061144A1
公开(公告)日:2022-02-24
申请号:US17421055
申请日:2020-01-09
Applicant: ASML Netherlands B.V.
Inventor: Georgiy Olegovich Vaschenko , Bob Rollinger
Abstract: A target delivery system for an extreme ultraviolet (EUV) light source is disclosed. The system includes: a conduit including an orifice configured to fluidly couple to a reservoir; an actuator configured to mechanically couple to the conduit such that motion of the actuator is transferred to the conduit; and a control system coupled to the actuator, the control system being configured to: determine an indication of pressure applied to target material in the reservoir, and control the motion of the actuator based on the determined indication of applied pressure. Moreover, techniques for operating a supply system are disclosed. For example, one or more characteristics of the supply system are determined, and an actuator that is mechanically coupled to the supply system is controlled based on the one or more determined characteristics such that an orifice of the supply system remains substantially free of material damage during operational use.
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公开(公告)号:US20240090109A1
公开(公告)日:2024-03-14
申请号:US18512264
申请日:2023-11-17
Applicant: ASML Netherlands B.V.
Inventor: Georgiy Olegovich Vaschenko , Bob Rollinger
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/008
Abstract: A target delivery system for an extreme ultraviolet (EUV) light source is disclosed. The system includes: a conduit including an orifice configured to fluidly couple to a reservoir; an actuator configured to mechanically couple to the conduit such that motion of the actuator is transferred to the conduit; and a control system coupled to the actuator, the control system being configured to: determine an indication of pressure applied to target material in the reservoir, and control the motion of the actuator based on the determined indication of applied pressure. Moreover, techniques for operating a supply system are disclosed. For example, one or more characteristics of the supply system are determined, and an actuator that is mechanically coupled to the supply system is controlled based on the one or more determined characteristics such that an orifice of the supply system remains substantially free of material damage during operational use.
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公开(公告)号:US11856681B2
公开(公告)日:2023-12-26
申请号:US17421055
申请日:2020-01-09
Applicant: ASML Netherlands B.V.
Inventor: Georgiy Olegovich Vaschenko , Bob Rollinger
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/008
Abstract: A target delivery system for an extreme ultraviolet (EUV) light source is disclosed. The system includes: a conduit including an orifice configured to fluidly couple to a reservoir; an actuator configured to mechanically couple to the conduit such that motion of the actuator is transferred to the conduit; and a control system coupled to the actuator, the control system being configured to: determine an indication of pressure applied to target material in the reservoir, and control the motion of the actuator based on the determined indication of applied pressure. Moreover, techniques for operating a supply system are disclosed. For example, one or more characteristics of the supply system are determined, and an actuator that is mechanically coupled to the supply system is controlled based on the one or more determined characteristics such that an orifice of the supply system remains substantially free of material damage during operational use.
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公开(公告)号:US12273986B2
公开(公告)日:2025-04-08
申请号:US18512264
申请日:2023-11-17
Applicant: ASML Netherlands B.V.
Inventor: Georgiy Olegovich Vaschenko , Bob Rollinger
Abstract: A target delivery system for an extreme ultraviolet (EUV) light source is disclosed. The system includes: a conduit including an orifice configured to fluidly couple to a reservoir; an actuator configured to mechanically couple to the conduit such that motion of the actuator is transferred to the conduit; and a control system coupled to the actuator, the control system being configured to: determine an indication of pressure applied to target material in the reservoir, and control the motion of the actuator based on the determined indication of applied pressure. Moreover, techniques for operating a supply system are disclosed. For example, one or more characteristics of the supply system are determined, and an actuator that is mechanically coupled to the supply system is controlled based on the one or more determined characteristics such that an orifice of the supply system remains substantially free of material damage during operational use.
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公开(公告)号:US20220295625A1
公开(公告)日:2022-09-15
申请号:US17637654
申请日:2020-09-04
Applicant: ASML Netherlands B.V.
Inventor: Georgiy Olegovich Vaschenko , Bob Rollinger , Joshua Mark Lukens , Alexander Igorevich Ershov , Yoshiho Amada
IPC: H05G2/00
Abstract: An apparatus includes: a tube; a body including: a first body wall and a second body wall; and a support structure including: a first support portion and a second support portion. The first body wall extends in a first direction, the second body wall extends in a second direction that is different than the first direction, a first portion of the tube passes through an opening in the second body wall the first support portion is configured to attach to the first body wall, and a second portion of the tube is configured to pass through the second support portion when the first support portion is attached to the first body wall. An interior of the tube and an interior of the body are configured to receive molten target material, and the target material emits extreme ultraviolet (EUV) light when in a plasma state.
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公开(公告)号:US20210392733A1
公开(公告)日:2021-12-16
申请号:US17284060
申请日:2019-10-25
Applicant: ASML Netherlands B.V.
Inventor: Bob Rollinger , Georgiy Olegovich Vaschenko , Chirag Rajyaguru , Alexander Igorevich Ershov , Joshua Mark Lukens , Mathew Cheeran Abraham
IPC: H05G2/00
Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.
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公开(公告)号:US20210311398A1
公开(公告)日:2021-10-07
申请号:US17273978
申请日:2019-09-20
Applicant: ASML Netherlands B.V.
Inventor: Georgiy Olegovich Vaschenko
Abstract: A system for an extreme ultraviolet light source includes a capillary tube, the capillary tube including a sidewall extending from a first end to a second end, the sidewall including an exterior wall and an interior wall, the interior wall defining a passage that extends from the first end to the second end; an actuator configured to be positioned at the exterior wall of the capillary tube; and an adhesive between the exterior wall and the actuator, the adhesive being configured to mechanically couple the actuator and the capillary tube, wherein the adhesive occupies a volume that remains substantially the same or expands as a result of curing.
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