公开(公告)号：US10401723B2

公开(公告)日：2019-09-03

申请号：US16300370

申请日：2017-05-30

Applicant: ASML Netherlands B.V.

Inventor： Pieter Cristiaan De Groot ,  Gerard Frans Jozef Schasfoort ,  Maksym Yuriiovych Sladkov ,  Manfred Petrus Johannes Maria Dikkers ,  Jozef Maria Finders ,  Pieter-Jan Van Zwol ,  Johannes Jacobus Matheus Baselmans ,  Stefan Michael Bruno Baumer ,  Laurentius Cornelius De Winter ,  Wouter Joep Engelen ,  Marcus Adrianus Van De Kerkhof ,  Robbert Jan Voogd

IPC: G02B5/02 ,  G03F7/20 ,  G03F1/24 ,  G03F1/42 ,  G03F1/44 ,  G03F9/00 ,  G02B5/22 ,  G02B5/18

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.

公开(公告)号：US10732498B2

公开(公告)日：2020-08-04

申请号：US16502674

申请日：2019-07-03

Applicant: ASML Netherlands B.V.

Inventor： Pieter Cristiaan De Groot ,  Gerard Frans Jozef Schasfoort ,  Maksym Yuriiovych Sladkov ,  Manfred Petrus Johannes Maria Dikkers ,  Jozef Maria Finders ,  Pieter-Jan Van Zwol ,  Johannes Jacobus Matheus Baselmans ,  Stefan Michael Bruno Baumer ,  Laurentius Cornelius De Winter ,  Wouter Joep Engelen ,  Marcus Adrianus Van De Kerkhof ,  Robbert Jan Voogd

IPC: G03F1/24 ,  G03F1/42 ,  G03F1/44 ,  G02B5/02 ,  G03F7/20 ,  G03F9/00 ,  G02B5/22 ,  G02B5/18

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.