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公开(公告)号：US11250559B2
公开(公告)日：2022-02-15
申请号：US16895412
申请日：2020-06-08
Applicant: ASML Netherlands B.V.
Inventor： Wei Fang , Zhao-Li Zhang , Jack Jau
Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.
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公开(公告)号：US11217423B2
公开(公告)日：2022-01-04
申请号：US16357309
申请日：2019-03-18
Applicant: ASML Netherlands B.V.
Inventor： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen , Jack Jau
IPC: H01J37/28
Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.
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Patent Agency Ranking
公开(公告)号：US11430631B2
公开(公告)日：2022-08-30
申请号：US16833463
申请日：2020-03-27
Applicant: ASML Netherlands B.V.
Inventor： Kuo-Shih Liu , Xuedong Liu , Wei Fang , Jack Jau
Abstract: Disclosed herein is a method comprising: generating a plurality of probe spots on a sample by a plurality of beams of charged particles; while scanning the plurality of probe spots across a region on the sample, recording from the plurality of probe spots a plurality of sets of signals respectively representing interactions of the plurality of beams of charged particles and the sample; generating a plurality of images of the region respectively from the plurality of sets of signals; and generating a composite image of the region from the plurality of images.
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公开(公告)号：US10679340B2
公开(公告)日：2020-06-09
申请号：US16160958
申请日：2018-10-15
Applicant: ASML Netherlands B.V.
Inventor： Wei Fang , Zhao-Li Zhang , Jack Jau
Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.
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公开(公告)号：US11880971B2
公开(公告)日：2024-01-23
申请号：US17671522
申请日：2022-02-14
Applicant: ASML Netherlands B.V.
Inventor： Wei Fang , Zhao-Li Zhang , Jack Jau
CPC classification number: G06T7/001 , G06T7/0004 , G06V10/44 , G06V10/50 , G06T2207/10004 , G06T2207/10061 , G06T2207/30148 , G06V10/467 , G06V2201/06
Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.
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公开(公告)号：US10586681B2
公开(公告)日：2020-03-10
申请号：US14830062
申请日：2015-08-19
Applicant: ASML Netherlands B.V.
Inventor： Zhongwei Chen , Jack Jau , Weiming Ren
IPC: H01J37/28 , H01J37/26 , H01J37/244 , H01J37/10 , H01J37/14 , H01J37/20 , H01J37/22 , H01J37/02 , H01J37/285 , H01J37/29
Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.
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公开(公告)号：US11043356B2
公开(公告)日：2021-06-22
申请号：US16700552
申请日：2019-12-02
Applicant: ASML Netherlands B.V.
Inventor： Wei Fang , Kevin Liu , Fei Wang , Jack Jau , Zhaohui Guo
IPC: H01J37/20 , H01J37/06 , H01J37/22 , H01J37/30 , H01J37/304
Abstract: A calibration method for calibrating the position error in the point of interest induced from the stage of the defect inspection tool is achieved by controlling the deflectors directly. The position error in the point of interest is obtained from the design layout database.
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