公开(公告)号：US20200218170A1

公开(公告)日：2020-07-09

申请号：US16822870

申请日：2020-03-18

Applicant: ASML Netherlands B.V.

Inventor： Emil Peter SCHMITT-WEAVER ,  Jens STÄCKER ,  Koenraad Remi André Maria SCHREEL ,  Roy WERKMAN

IPC: G03F9/00 ,  G03F7/20

Abstract: A first substrate 2002 has a calibration pattern applied to a first plurality of fields 2004 by a lithographic apparatus. Further substrates 2006, 2010 have calibration patterns applied to further pluralities of fields 2008, 2012. The different pluralities of fields have different sizes and/or shapes and/or positions. Calibration measurements are performed on the patterned substrates 2002, 2006, 2010 and used to obtain corrections for use in controlling the apparatus when applying product patterns to subsequent substrates. Measurement data representing the performance of the apparatus on fields of two or more different dimensions (fields 2004, 2008, 2012 in this example) is gathered together in a database 2013 and used to synthesize the information needed to calibrate the apparatus for a new size. Calibration data is also obtained for different scan and step directions.

公开(公告)号：US20180173118A1

公开(公告)日：2018-06-21

申请号：US15736451

申请日：2016-05-27

Applicant: ASML Netherlands B.V.

Inventor： Emil Peter SCHMITT-WEAVER ,  Jens STÄCKER ,  Koenraad Remi André Maria SCHREEL ,  Roy WERKMAN

IPC: G03F9/00 ,  G03F7/20 ,  G05B19/4097

CPC classification number: G03F9/7019 ,  G03F7/705 ,  G03F7/70516 ,  G03F7/70633 ,  G05B19/4097 ,  G05B2219/35012 ,  G05B2219/45028 ,  G05B2219/45031

Abstract: A first substrate (2002) has a calibration pattern applied to a first plurality of fields (2004) by a lithographic apparatus. Further substrates (2006, 2010) have calibration patterns applied to further pluralities of fields (2008, 2012). The different pluralities of fields have different sizes and/or shapes and/or positions. Calibration measurements are performed on the patterned substrates (2002, 2006, 2010) and used to obtain corrections for use in controlling the apparatus when applying product patterns to subsequent substrates. Measurement data representing the performance of the apparatus on fields of two or more different dimensions (2004, 2008, 2012) is gathered together in a database (2013) and used to synthesize the information needed to calibrate the apparatus for a new size. Calibration data is also obtained for different scan and step directions.