公开(公告)号：US20160192468A1

公开(公告)日：2016-06-30

申请号：US14979657

申请日：2015-12-28

Applicant: ASML Netherlands B.V.

Inventor： Robert Jay Rafac ,  Richard L. Sandstrom ,  Daniel John William Brown ,  Kai-Chung Hou

IPC: H05G2/00 ,  G03F7/20

Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.

公开(公告)号：US20150208494A1

公开(公告)日：2015-07-23

申请号：US14489411

申请日：2014-09-17

Applicant: ASML Netherlands B.V.

Inventor： Robert J. Rafac ,  Richard L. Sandstrom ,  Daniel Brown ,  Kai-Chung Hou

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70058

Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.

Abstract translation: 目标材料设置在目标位置，目标材料包括当转换成等离子体时发射极紫外光的材料，目标材料沿着第一方向沿第一方向延伸并且沿第二方向延伸到第二范围内; 放大的光束沿着传播方向被引向目标位置; 并且放大的光束聚焦在焦平面中，其中目标位置在焦平面之外，并且放大的光束和目标材料之间的相互作用将至少部分目标材料转换成发射EUV光的等离子体。

公开(公告)号：US10667377B2

公开(公告)日：2020-05-26

申请号：US14979657

申请日：2015-12-28

Applicant: ASML Netherlands B.V.

Inventor： Robert Jay Rafac ,  Richard L. Sandstrom ,  Daniel John William Brown ,  Kai-Chung Hou

IPC: H05G2/00 ,  G03F7/20

Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.

公开(公告)号：US09232623B2

公开(公告)日：2016-01-05

申请号：US14489411

申请日：2014-09-17

Applicant: ASML Netherlands B.V.

Inventor： Robert J. Rafac ,  Richard L. Sandstrom ,  Daniel Brown ,  Kai-Chung Hou

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70058

Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.

Abstract translation: 目标材料设置在目标位置，目标材料包括当转换成等离子体时发射极紫外光的材料，目标材料沿着第一方向沿第一方向延伸并且沿第二方向延伸到第二范围内; 放大的光束沿着传播方向被引向目标位置; 并且放大的光束聚焦在焦平面中，其中目标位置在焦平面之外，并且放大的光束和目标材料之间的相互作用将至少部分目标材料转换成发射EUV光的等离子体。