公开(公告)号：US12112260B2

公开(公告)日：2024-10-08

申请号：US16424811

申请日：2019-05-29

Applicant: ASML Netherlands B.V.

Inventor： Lorenzo Tripodi ,  Patrick Warnaar ,  Grzegorz Grzela ,  Mohammadreza Hajiahmadi ,  Farzad Farhadzadeh ,  Patricius Aloysius Jacobus Tinnemans ,  Scott Anderson Middlebrooks ,  Adrianus Cornelis Matheus Koopman ,  Frank Staals ,  Brennan Peterson ,  Anton Bernhard Van Oosten

IPC: G06N3/08 ,  G01B11/02 ,  G01N21/55 ,  G06T7/00

CPC classification number: G06N3/08 ,  G01B11/02 ,  G01N21/55 ,  G06T7/0006 ,  G06T7/001 ,  G01B2210/56 ,  G06T2207/20081 ,  G06T2207/20084 ,  G06T2207/30148

Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.