公开(公告)号：US20230185990A1

公开(公告)日：2023-06-15

申请号：US18095515

申请日：2023-01-10

申请人： ASML NETHERLANDS B.V.

发明人： Lotte Marloes Willems ,  Kaustuve Bhattacharyya ,  Panagiotis Pieter Bintevinos ,  Guangqing Chen ,  Martin Ebert ,  Pieter Jacob Mathias Hendrik Knelissen ,  Stephen Morgan ,  Maurits Van Der Schaar ,  Leonardus Henricus Marie Verstappen ,  Jen-Shiang Wang ,  Peter Hanzen Wardenier

IPC分类号： G06F30/20 ,  G03F7/20 ,  G03F9/00

CPC分类号： G06F30/20 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70683 ,  G03F7/70633 ,  G03F9/7046 ,  G06F2111/10

摘要： A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.

公开(公告)号：US11580274B2

公开(公告)日：2023-02-14

申请号：US15559759

申请日：2016-03-24

申请人： ASML Netherlands B.V.

发明人： Lotte Marloes Willems ,  Kaustuve Bhattacharyya ,  Panagiotis Pieter Bintevinos ,  Guangqing Chen ,  Martin Ebert ,  Pieter Jacob Mathias Hendrik Knelissen ,  Stephen Morgan ,  Maurits Van Der Schaar ,  Leonardus Henricus Marie Verstappen ,  Jen-Shiang Wang ,  Peter Hanzen Wardenier

IPC分类号： G03F7/20 ,  G06F30/20 ,  G03F9/00 ,  G06F111/10

摘要： A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.